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Inventor

Theodorus Wilhelmus Driessen

Inventor
San Diego, CA, US

Overview

3→
Patents
2019–2021
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
H05GX-ray technique38%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems25%
PatentTitleYear
10,904,994Supply system for an extreme ultraviolet light source202110,499,485Supply system for an extreme ultraviolet light source201910,481,498Droplet generator for lithographic apparatus, EUV source and lithographic apparatus2019

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2019–2021Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2019–2021Based in San Diego, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32019–2021
Locations
LocationPatentsSpan
San Diego, California, US32019–2021