Inventor
SHAHID RAUF
Inventor
US
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps39%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H01LSemiconductor devices13%
H05HPlasma technique13%
H02NElectric machines not otherwise provided for9%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling4%
PatentTitleYear
12,555,748Symmetric plasma process chamber202612,300,473Electrostatic chuck for high bias radio frequency (RF) power application in a plasma processing chamber202512,237,149Reducing aspect ratio dependent etch with direct current bias pulsing202512,080,519Smart dynamic load simulator for RF power delivery control system202411,935,724Symmetric VHF source for a plasma reactor202411,587,766Symmetric VHF source for a plasma reactor202311,551,965Apparatus to reduce polymers deposition202311,315,760Symmetric plasma process chamber202211,189,502Showerhead with interlaced gas feed and removal and methods of use2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to APPLIED MATERIALS INC (9)· patent assignee history
2021–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 9 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 9 | 2021–2026 |