Inventor

Gregory J. Wilson

Inventor
Kalispell, MT, US

Overview

82→
Patents
1994–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 82 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C25Dprimary
C25DProcesses for the electrolytic or electrophoretic production of coatings27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
C25FProcesses for the electrolytic removal of materials from objects5%
H01LSemiconductor devices5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
Y10TTechnical subjects covered by former us classification4%
C23CCoating metallic material3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
A61FFilters implantable into blood vessels2%
PatentTitleYear
10,837,119Microelectronic substrate electro processing system202010,814,019MRI signal suppression agents, compositions, and methods202010,754,252Apparatus for post exposure bake202010,655,226Apparatus and methods to improve ALD uniformity202010,577,712Electroplating apparatus with electrolyte agitation202010,570,526Electroplating wafers having a pattern induced non-uniformity202010,494,731Electroplating dynamic edge control201910,364,506Electroplating apparatus with current crowding adapted contact ring seal and thief electrode201910,240,248Adaptive electric field shielding in an electroplating processor using agitator geometry and motion control201910,232,413Controlled fluid flow for cleaning an optical element201910,227,707Inert anode electroplating processor and replenisher201910,227,706Electroplating apparatus with electrolyte agitation201910,191,379Removing photoresist from a wafer201910,113,245Electroplating contact ring with radially offset contact fingers201810,087,543Seal rings in electrochemical processors201810,081,881Electroplating apparatus with membrane tube shield201810,047,453Electroplating apparatus201810,008,729High performance flow battery20189,994,376Package comprising a plurality of individually wrapped articles20189,958,782Apparatus for post exposure bake20189,920,448'Inert anode electroplating processor and replenisher with anionic membranes'20189,776,218'Controlled fluid flow for cleaning an optical element'20179,765,443'Electroplating processor with current thief electrode'20179,758,897'Electroplating apparatus with notch adapted contact ring seal and thief electrode'20179,689,082'Electroplating wafers having a notch'20179,560,730'Transport system for an extreme ultraviolet light source'20179,557,650'Transport system for an extreme ultraviolet light source'20179,469,911'Electroplating apparatus with membrane tube shield'20169,249,195'Reovirus vaccines and methods of use therefor'20169,245,767'Anneal module for semiconductor wafers'20169,222,195'Electroplating systems and methods for high sheet resistance substrates'20159,160,025'Flow battery systems'20159,120,609'Wrapper for personal care article'20159,099,297'Electrochemical processor'20158,968,531'Electro processor with shielded contact ring'20158,968,533'Electroplating processor with geometric electrolyte flow path'20158,900,425'Contact ring for an electrochemical processor'20148,859,842'Embossed absorbent article'20148,808,888'Flow battery systems'20148,496,790'Electrochemical processor'20138,496,775'Method for embossing an absorbent article'20138,496,789'Electrochemical processor'20138,491,742'Method for embossing an absorbent article using a segmented anvil'20138,313,631'Apparatus and methods for electrochemical processing of microfeature wafers'20127,935,230'Electro-chemical processor'20117,931,786'Apparatus and method for agitating liquids in wet chemical processing of microfeature workpieces'20117,927,469'Electro-chemical processor'20117,909,967'Electro-chemical processor'20117,857,958'Method and apparatus for controlling vessel characteristics, including shape and thieving current for processing microfeature workpieces'20107,842,173'Apparatus and methods for electrochemical processing of microfeature wafers'20107,566,386'System for electrochemically processing a workpiece'20097,438,788'Apparatus and methods for electrochemical processing of microelectronic workpieces'20087,393,439'Integrated microfeature workpiece processing tools with registration systems for paddle reactors'20087,390,382'Reactors having multiple electrodes and/or enclosed reciprocating paddles, and associated methods'20087,390,383'Paddles and enclosures for enhancing mass transfer during processing of microfeature workpieces'20087,371,998'Thermal wafer processor'20087,332,066'Apparatus and method for electrochemically depositing metal on a semiconductor workpiece'20087,294,243'Contact assemblies for electrochemical processing of microelectronic workpieces and method of making thereof'20077,267,749'Workpiece processor having processing chamber with improved processing fluid flow'20077,264,698'Apparatus and methods for electrochemical processing of microelectronic workpieces'20077,252,714'Apparatus and method for thermally controlled processing of microelectronic workpieces'20077,247,223'Method and apparatus for controlling vessel characteristics, including shape and thieving current for processing microfeature workpieces'20077,189,318'Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece'20077,161,689'Apparatus and method for processing a microelectronic workpiece using metrology'20077,160,421'Turning electrodes used in a reactor for electrochemically processing a microelectronic workpiece'20077,115,196'Apparatus and method for electrochemically depositing metal on a semiconductor workpiece'20067,102,763'Methods and apparatus for processing microelectronic workpieces using metrology'20067,020,537'Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece'20066,962,649'Contact assemblies, methods for making contact assemblies, and machines with contact assemblies for electrochemical processing of microelectronic workpieces'20056,921,467'Processing tools, components of processing tools, and method of making and using same for electrochemical processing of microelectronic workpieces'20056,861,027'Method and apparatus for processing a microelectronic workpiece including an apparatus and method for executing a processing step at an elevated temperature'20056,851,441'Apparatus for collecting rainwater'20056,782,645'Safety guard and deactivation device'20046,780,374'Method and apparatus for processing a microelectronic workpiece at an elevated temperature'20046,747,734'Apparatus and method for processing a microelectronic workpiece using metrology'20046,660,137'System for electrochemically processing a workpiece'20036,569,297'Workpiece processor having processing chamber with improved processing fluid flow'20036,565,729'Method for electrochemically depositing metal on a semiconductor workpiece'20036,471,913'Method and apparatus for processing a microelectronic workpiece including an apparatus and method for executing a processing step at an elevated temperature'20026,428,673'Apparatus and method for electrochemical processing of a microelectronic workpiece, capable of modifying processing based on metrology'20026,191,388'Thermal processor and components thereof'2001D0344098'Coin operated cartoon house'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–2016Patents assigned to WILSON GREGORY J (13)· patent assignee history
2001–2011Patents assigned to SEMITOOL INC (35)· patent assignee history
2001–2020Based in Kalispell, MT, US· patent location history
2012–2020Patents assigned to APPLIED MATERIALS INC (33)· patent assignee history
2012–2015Patents assigned to MCHUGH PAUL R (7)· patent assignee history
2013–2018Patents assigned to PROCTER & GAMBLE (5)· patent assignee history
2013–2014Based in Mason, OH, US· patent location history
2015–2018Based in New Gloucester, ME, US· patent location history
2017–2019Based in San Diego, CA, US· patent location history
2020Based in Seattle, WA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEMITOOL INC352001–2011
APPLIED MATERIALS INC332012–2020
WILSON GREGORY Jself131994–2016
MCHUGH PAUL R72012–2015
PROCTER & GAMBLE52013–2018
Locations
LocationPatentsSpan
Kalispell, MT, US682001–2020
San Diego, California, US42017–2019
Mason, OH, US32013–2014
New Gloucester, ME, US22015–2018
Seattle, Washington, US12020