Inventor

Sridhar K. Kailasam

Inventor
Fremont, CA, US

Overview

51→
Patents
2003–2021
Patent span
Physics
Primary field (CPC G)

Patents· 51 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Fprimary
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein25%
C03CChemical composition of glasses, glazes or vitreous enamels11%
C23CCoating metallic material11%
E06BFixed or movable closures for openings in buildings, vehicles, fences or like enclosures in general, e.g. doors, windows, blinds, gates8%
B23KSoldering or unsoldering5%
B05DProcesses for applying fluent materials to surfaces, in general4%
H05BElectric heating4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
H01JElectric discharge tubes or discharge lamps4%
Y10TTechnical subjects covered by former us classification4%
PatentTitleYear
11,112,674Controlling transitions in optically switchable devices202111,054,711Electromagnetic-shielding electrochromic windows202110,969,646Controlling transitions in optically switchable devices202110,969,645Faster switching low-defect electrochromic windows202110,895,793Mitigating defects in an electrochromic device under a bus bar202110,890,820Multi-pane electrochromic windows202110,852,613Counter electrode material for electrochromic devices202010,831,077Fabrication of electrochromic devices202010,788,723Fabrication of electrochromic devices202010,782,583Spacers for insulated glass units202010,690,987Counter electrode for electrochromic devices202010,684,523Counter electrode for electrochromic devices202010,663,830Fabrication of low defectivity electrochromic devices202010,591,795Counter electrode for electrochromic devices202010,585,321Counter electrode for electrochromic devices202010,534,237Pinhole mitigation for optical devices202010,520,783Mitigating defects in an electrochromic device under a bus bar201910,514,582Controlling transitions in optically switchable devices201910,503,039Controlling transitions in optically switchable devices201910,401,702Controlling transitions in optically switchable devices201910,345,671Counter electrode for electrochromic devices201910,288,969Defect-mitigation layers in electrochromic devices201910,261,381Fabrication of low defectivity electrochromic devices201910,254,615Fabrication of low defectivity electrochromic devices201910,228,601Counter electrode for electrochromic devices201910,156,762Counter electrode for electrochromic devices201810,088,731Multi-pane electrochromic windows201810,054,833Fabrication of low defectivity electrochromic devices20189,904,138'Fabrication of low defectivity electrochromic devices'20189,897,888'Spacers for insulated glass units'20189,885,935'Controlling transitions in optically switchable devices'20189,829,763Multi-pane electrochromic windows20179,638,977'Pinhole mitigation for optical devices'20179,429,809'Fabrication of low defectivity electrochromic devices'20169,229,291'Defect-mitigation layers in electrochromic devices'20169,158,173'Spacers for insulated glass units'20159,116,410'Multi-pane electrochromic windows'20159,007,674'Defect-mitigation layers in electrochromic devices'20158,908,259'Multi-pane electrochromic windows'20148,711,465'Spacers for insulated glass units'20148,665,512'Multi-pane electrochromic windows'20148,270,059'Multi-pane electrochromic windows'20127,781,327'Resputtering process for eliminating dielectric damage'20107,446,032'Methods of providing an adhesion layer for adhesion of barrier and/or seed layers to dielectric films'20087,425,506'Methods of providing an adhesion layer for adhesion of barrier and/or seed layers to dielectric films'20087,341,946'Methods for the electrochemical deposition of copper onto a barrier layer of a work piece'20086,974,768'Methods of providing an adhesion layer for adhesion of barrier and/or seed layers to dielectric films'20056,709,557'Sputter apparatus for producing multi-component metal alloy films and method for making the same'20046,607,982'High magnesium content copper magnesium alloys as diffusion barriers'20036,589,887'Forming metal-derived layers by simultaneous deposition and evaporation of metal'20036,525,829'Method and apparatus for in-situ measurement of thickness of copper oxide film using optical reflectivity'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2010Patents assigned to NOVELLUS SYSTEMS INC (9)· patent assignee history
2003–2021Based in Fremont, CA, US· patent location history
2003–2017Based in Santa Clara, CA, US· patent location history
2005Based in Freemont, CA, US· patent location history
2012–2016Patents assigned to KAILASAM SRIDHAR (4)· patent assignee history
2012–2016Patents assigned to FRIEDMAN ROBIN (3)· patent assignee history
2012–2014Patents assigned to MULPURI RAO (2)· patent assignee history
2014–2021Patents assigned to VIEW INC (41)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
VIEW INC412014–2021
NOVELLUS SYSTEMS INC92003–2010
KAILASAM SRIDHARself42012–2016
FRIEDMAN ROBIN32012–2016
MULPURI RAO22012–2014
Locations
LocationPatentsSpan
Fremont, California, US462003–2021
Santa Clara, California, US42003–2017
Freemont, California, US12005