Inventor
Sam Gu
Inventor
Seoul, KR
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B25Jprimary
B25JManipulators20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
G10LSpeech analysis techniques or speech synthesis20%
H03GControl of amplification20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
10,943,597Method of controlling volume in a noise adaptive manner and apparatus implementing thereof20216,562,700'Process for removal of resist mask over low k carbon-doped silicon oxide dielectric material of an integrated circuit structure, and removal of residues from via etch and resist mask removal'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003Patents assigned to LSI LOGIC CORP (1)· patent assignee history
2003Based in Vancouver, WA, US· patent location history
2021Patents assigned to LG ELECTRONICS INC (1)· patent assignee history
2021Based in Seoul, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LG ELECTRONICS INC | 1 | 2021 |
| LSI LOGIC CORP | 1 | 2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 1 | 2021 |
| Vancouver, Washington, US | 1 | 2003 |