Inventor

Mitsuhiro Ichijo

Inventor

Kanagawa, JP

Overview

1994–2021

Patent span

Electricity

Primary field (CPC H)

Patents· 88 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary

H10DInorganic electric semiconductor devices29%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%

H01LSemiconductor devices12%

C23CCoating metallic material7%

H10KOrganic electric solid-state devices7%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%

H10HInorganic light-emitting semiconductor devices having potential barriers4%

H01JElectric discharge tubes or discharge lamps3%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein1%

G06FElectric digital data processing1%

PatentTitleYear

10,950,734Semiconductor device and manufacturing method thereof2021 10,923,600Semiconductor device and manufacturing method thereof2021 10,522,397Manufacturing method of semiconductor device2019 10,468,531Semiconductor device and manufacturing method of the same2019 10,236,389Manufacturing method of semiconductor device2019 10,192,995Semiconductor device and manufacturing method thereof2019 10,141,337Semiconductor device2018 10,103,211Luminescent device having light-emitting element and transistor2018 10,056,497Semiconductor device and manufacturing method thereof2018 10,050,132Method for manufacturing semiconductor device2018 10,020,322Transistor and semiconductor device2018 9,917,209'Manufacturing method of semiconductor device including step of forming trench over semiconductor'2018 9,852,850Electrode, power storage device, electronic device, and vehicle2017 9,842,939'Semiconductor device'2017 9,806,201'Semiconductor device'2017 9,793,295'Semiconductor device'2017 9,786,495'Method for evaluating semiconductor film and method for manufacturing semiconductor device'2017 9,761,645'Luminescent device having light emitting element and transistor'2017 9,722,056'Method for manufacturing semiconductor device'2017 9,685,561'Method for manufacturing a semiconductor device'2017 9,543,577'Active material, electrode including the active material and manufacturing method thereof, and secondary battery'2017 9,520,410'Display device and method for manufacturing the same'2016 9,496,376'Method for manufacturing semiconductor device'2016 9,490,368'Semiconductor device and manufacturing method of the same'2016 9,478,664'Semiconductor device'2016 9,443,988'Semiconductor device'2016 9,437,594'Semiconductor device'2016 9,384,976'Method for manufacturing semiconductor device'2016 9,368,561'Luminescent device having light-emitting element and transistor'2016 9,349,820'Method for manufacturing semiconductor device'2016 9,076,876'Semiconductor device'2015 8,956,934'Thin film transistor and method for manufacturing the same'2015 8,951,902'Methods of removing contaminant impurities during the manufacture of a thin film transistor by applying water in which ozone is dissolved'2015 8,927,351'Method for manufacturing semiconductor device'2015 8,853,684'Semiconductor device'2014 8,829,527'Display device and method for manufacturing the same'2014 8,823,009'Display device and method for manufacturing the same'2014 8,809,203'Method for manufacturing semiconductor device using a microwave plasma CVD apparatus'2014 8,803,152'Luminescent device and process of manufacturing the same'2014 8,603,899'Method of manufacturing a semiconductor device'2013 8,592,908'Semiconductor substrate and manufacturing method of semiconductor device'2013 8,569,120'Method for manufacturing thin film transistor'2013 8,557,687'Method for forming microcrystalline semiconductor film and method for manufacturing thin film transistor'2013 8,552,425'Semiconductor device'2013 8,486,777'Method for manufacturing microcrystalline semiconductor and thin film transistor'2013 8,476,638'Plasma CVD apparatus'2013 8,450,741'Luminescent device and process of manufacturing the same'2013 8,441,010'Semiconductor device'2013 8,344,378'Thin film transistor and method for manufacturing the same'2013 8,324,699'Method for manufacturing semiconductor device'2012 8,304,327'Method of manufacturing a semiconductor device'2012 8,300,168'Display device comprising an antioxidant film formed on a microcrystalline semiconductor film wherein the antioxidant film has a recessed portion overlapping a channel region'2012 8,252,669'Method for manufacturing microcrystalline semiconductor film by plasma CVD apparatus'2012 8,247,315'Plasma processing apparatus and method for manufacturing semiconductor device'2012 8,217,396'Display device comprising electrode layer contacting wiring in the connection region and extending to pixel region'2012 8,138,101'Manufacturing method for semiconductor device'2012 8,114,760'Method for manufacturing microcrystalline semiconductor and thin film transistor'2012 8,022,404'Luminescent device and process of manufacturing the same'2011 7,989,273'Semiconductor substrate and manufacturing method of semiconductor device'2011 7,855,153'Method for manufacturing semiconductor device'2010 7,670,881'Method of manufacturing a semiconductor device'2010 7,569,256'Plasma CVD apparatus and dry cleaning method of the same'2009 7,538,011'Method of manufacturing a semiconductor device'2009 7,465,966'Film formation method and manufacturing method of semiconductor device'2008 7,442,592'Manufacturing a semiconductor device'2008 7,408,191'Luminescent device and process of manufacturing the same'2008 7,384,828'Semiconductor film, semiconductor device and method of their production'2008 7,368,335'Semiconductor device and method of manufacturing the same'2008 7,316,947'Method of manufacturing a semiconductor device'2008 7,306,982'Method of manufacturing a semiconductor device'2007 7,223,446'Plasma CVD apparatus and dry cleaning method of the same'2007 7,220,613'Manufacturing method for semiconductor device'2007 7,208,394'Method of manufacturing a semiconductor device with a fluorine concentration'2007 7,199,027'Method of manufacturing a semiconductor film by plasma CVD using a noble gas and nitrogen'2007 7,169,689'Method of manufacturing a semiconductor device'2007 7,109,074'Method of manufacturing a semiconductor device'2006 7,034,337'Semiconductor device and method of manufacturing the same'2006 6,875,674'Method of manufacturing a semiconductor device with fluorine concentration'2005 6,867,077'Semiconductor device and method of manufacturing the same'2005 6,821,828'Method of manufacturing a semiconductor device'2004 6,808,968'Method of manufacturing a semiconductor device'2004 6,794,229'Manufacturing method for semiconductor device'2004 6,743,700'Semiconductor film, semiconductor device and method of their production'2004 6,717,181'Luminescent device having thin film transistor'2004 6,703,265'Semiconductor device and method of manufacturing the same'2004 6,675,816'Plasma CVD apparatus and dry cleaning method of the same'2004 6,506,636'Method of manufacturing a semiconductor device having a crystallized amorphous silicon film'2003 5,330,578'Plasma treatment apparatus'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–2021Patents assigned to SEMICONDUCTOR ENERGY LAB (88)· patent assignee history

1994–2021Based in Kanagawa, JP· patent location history

2004–2018Based in Atsugi, JP· patent location history

2005–2016Based in Tochigi, JP· patent location history

2010–2019Based in Zama, JP· patent location history

2012–2017Patents assigned to ICHIJO MITSUHIRO (25)· patent assignee history

2012–2015Patents assigned to YAMAZAKI SHUNPEI (12)· patent assignee history

2012–2015Patents assigned to OHTSUKI TAKASHI (11)· patent assignee history

2012–2017Patents assigned to ENDO TOSHIYA (9)· patent assignee history

2012Based in Kangawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SEMICONDUCTOR ENERGY LAB	88	1994–2021
ICHIJO MITSUHIROself	25	2012–2017
YAMAZAKI SHUNPEI	12	2012–2015
OHTSUKI TAKASHI	11	2012–2015
ENDO TOSHIYA	9	2012–2017

Locations

Location	Patents	Span
Kanagawa, JP	41	1994–2021
Zama, JP	22	2010–2019
Atsugi, JP	16	2004–2018
Tochigi, JP	8	2005–2016
Kangawa, JP	1	2012