Inventor

Kishio Sugawara

Inventor

Hamura, JP

Overview

1988–2006

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C03Bprimary

C03BManufacture, shaping, or supplementary processes57%

Y02PClimate change mitigation technologies in the production or processing of goods33%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1988–2006Patents assigned to HOYA CORP (11)· patent assignee history

1988Patents assigned to HIROTA SHINICHIRO (1)· patent assignee history

1988Patents assigned to IZUMITANI TETSURO (1)· patent assignee history

1988Patents assigned to MEISSNER HELMUTH E (1)· patent assignee history

1988Patents assigned to SUGAWARA KISHIO (1)· patent assignee history

1988–2002Based in Tokyo, JP· patent location history

1988Based in Nishitama-gun, JP· patent location history

1989–2006Based in Hamura, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations