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Inventor

Norio Kanetsuki

Inventor
Tenri, JP

Overview

2→
Patents
2003–2005
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
C23CCoating metallic material20%
C23FNon-mechanical removal of metallic material from surface20%
H01JElectric discharge tubes or discharge lamps20%
PatentTitleYear
6,893,970'Plasma processing method'20056,527,908'Plasma process apparatus'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003Patents assigned to OHMI TADAHIRO (1)· patent assignee history
2003Patents assigned to SHARP KK (1)· patent assignee history
2003–2005Based in Tenri, JP· patent location history
2005Patents assigned to TADAHIRO OHMI (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
OHMI TADAHIRO12003
SHARP KK12003
TADAHIRO OHMI12005
Locations
LocationPatentsSpan
Tenri, JP22003–2005