Inventor
Seiji Nagahara
Inventor
Tokyo, JP
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H01LSemiconductor devices11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them5%
C07CAcyclic or carbocyclic compounds4%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%
G02BOptical elements, systems or apparatus4%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light4%
H04NPictorial communication, e.g. television4%
PatentTitleYear
11,061,332Methods for sensitizing photoresist using flood exposures202110,984,344Document classifying device202110,747,121Optical processing apparatus and substrate processing apparatus202010,558,125Exposure apparatus, exposure apparatus adjustment method and storage medium202010,534,266Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes202010,527,948Optical processing apparatus, coating/development apparatus, optical processing method, and non-transitory computer-readable storage medium202010,429,745Photo-sensitized chemically amplified resist (PS-CAR) simulation201910,396,262Light emitting device and substrate201910,274,843Exposure apparatus, exposure method and storage medium201910,215,362Light source apparatus with lens array201910,133,163Light source unit and optical engine201810,101,669Exposure apparatus, resist pattern forming method, and storage medium201810,073,348Resist-pattern-forming method and chemically amplified resist material201810,073,349Chemically amplified resist material, pattern-forming method, compound, and production method of compound201810,025,187Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting201810,025,190Substrate treatment system20189,971,247Pattern-forming method20189,709,882'Light source apparatus and projector having light source apparatus'20179,618,848'Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes'20179,519,227'Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)'20169,500,936'Light source device, and optical engine in which light source device is used'20169,459,520'Light source unit and optical engine'20168,397,182'Pattern verifying method, pattern verifying device, program, and manufacturing method of semiconductor device'20137,534,554'Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition'20097,479,361'Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process'20097,440,077'Exposure apparatus'20087,396,633'Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition'20087,217,654'Semiconductor device and method of manufacturing the same'20076,800,551'Chemical amplification type photoresist composition, method for producing a semiconductor device using the composition, and semiconductor substrate'20046,774,028'Method of forming wiring structure by using photo resist having optimum development rate'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2009Patents assigned to NEC ELECTRONICS CORP (7)· patent assignee history
2004–2020Based in Tokyo, JP· patent location history
2004–2021Based in Kanagawa, JP· patent location history
2008–2009Based in Kawasaki, JP· patent location history
2016–2021Patents assigned to TOKYO ELECTRON LTD (15)· patent assignee history
2016–2019Patents assigned to NICHIA CORP (6)· patent assignee history
2016–2019Based in Yokohama, JP· patent location history
2016–2020Based in Sagamihara, JP· patent location history
2018–2019Patents assigned to UNIV OSAKA (6)· patent assignee history
2018Patents assigned to JSR CORP (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 15 | 2016–2021 |
| NEC ELECTRONICS CORP | 7 | 2004–2009 |
| NICHIA CORP | 6 | 2016–2019 |
| UNIV OSAKA | 6 | 2018–2019 |
| JSR CORP | 3 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 11 | 2004–2020 |
| Kanagawa, JP | 6 | 2004–2021 |
| Yokohama, JP | 6 | 2016–2019 |
| Sagamihara, JP | 4 | 2016–2020 |
| Kawasaki, JP | 2 | 2008–2009 |