Inventor

Josef Robert Unternahrer

Inventor
Niskayuna, NY, US

Overview

21→
Patents
1990–2008
Patent span
Electricity
Primary field (CPC H)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Sprimary
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light36%
B23KSoldering or unsoldering22%
C21DModifying the physical structure of ferrous metals14%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein8%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light6%
G02BOptical elements, systems or apparatus6%
G01KMeasuring temperature3%
H05BElectric heating3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
7,319,708'Variable pulse repetition frequency passively Q-switched laser'20087,313,299'Laser beam transformation and combination using tapered waveguides'20077,193,771'Power scalable optical systems for generating, transporting, and delivering high power, high quality laser beams'20077,042,631'Power scalable optical systems for generating, transporting, and delivering high power, high quality, laser beams'20066,670,577'Laser shock peening method and apparatus'20036,404,787'Method and apparatus to select a predetermined number of pulses from a laser'20026,197,133'Short-pulse high-peak laser shock peening'20016,111,228'Method and apparatus for sensing properties of glass-ceramic cooktop'20006,108,357'Single head laser oscillator-amplifier'20006,021,154'Laser shock peening method and reflective laser beam homogenizer'20006,002,706'Method and apparatus for controlling the size of a laser beam'19995,987,042'Method and apparatus for shaping a laser pulse'19995,980,101'Method and apparatus for measuring laser pulse energy'19995,935,467'Oven for heating a crystal for a laser frequency conversion'19995,930,282'Method and apparatus for adjusting the pump distribution in a laser'19995,828,690'Unitary body laser head'19985,730,811'Cavity dumped laser shock peening process'19985,475,702'Diode pumped slab module'19955,241,551'High average power laser which generates radiation at a wavelength near 530 nm'19935,030,851'(RE.sub.x Y.sub.1-x Al.sub.3 (BO.sub.3).sub.4 crystals in electrooptic and nonlinear devices'19914,962,505'Solid-state laser device having a high conversion efficiency between electric power and output power and a lamp device therefor'1990

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1990Patents assigned to HOYA CORP (1)· patent assignee history
1990Based in Tokyo, JP· patent location history
1991Patents assigned to HOYA OPTICS INC (1)· patent assignee history
1991Based in Pleasanton, CA, US· patent location history
1993–2003Patents assigned to GEN ELECTRIC (15)· patent assignee history
1993–2002Based in Niskayuna, NY, US· patent location history
2003–2008Based in Lafayette, CO, US· patent location history
2006Patents assigned to COHERENT TECH INC (1)· patent assignee history
2007–2008Patents assigned to LOCKHEED MARTIN COHERENT TECHN (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
GEN ELECTRIC151993–2003
LOCKHEED MARTIN COHERENT TECHN32007–2008
COHERENT TECH INC12006
HOYA CORP11990
HOYA OPTICS INC11991
Locations
LocationPatentsSpan
Niskayuna, New York, US141993–2002
Lafayette, CO, US52003–2008
Pleasanton, California, US11991
Tokyo, JP11990