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Inventor

Monique Ben-Dor

Inventor
Palo Alto, CA, US

Overview

2→
Patents
2001–2003
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material25%
H01JElectric discharge tubes or discharge lamps25%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
PatentTitleYear
6,626,185'Method of depositing a silicon containing layer on a semiconductor substrate'20036,184,158'Inductively coupled plasma CVD'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2003Patents assigned to LAM RES CORP (2)· patent assignee history
2001–2003Based in Palo Alto, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LAM RES CORP22001–2003
Locations
LocationPatentsSpan
Palo Alto, California, US22001–2003