Inventor
Gregory R. McIntyre
Inventor
El Cerrito, CA, US
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G06Fprimary
G06FElectric digital data processing33%
Y02PClimate change mitigation technologies in the production or processing of goods29%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light7%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%
PatentTitleYear
9,261,793'Image optimization using pupil filters in projecting printing systems with fixed or restricted illumination angular distribution'20169,086,639'Fabrication of on-product aberration monitors with nanomachining'20159,052,617'Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks'20158,765,331'Reducing edge die reflectivity in extreme ultraviolet lithography'20148,769,474'Fast pattern matching'20148,748,063'Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks'20148,679,708'Polarization monitoring reticle design for high numerical aperture lithography systems'20148,631,373'Yield analysis with situations'20148,546,069'Method for enhancing lithographic imaging of isolated and semi-isolated features'20138,368,890'Polarization monitoring reticle design for high numerical aperture lithography systems'20138,365,103'System and method for implementing image-based design rules'20138,327,299'System and method for implementing image-based design rules'20128,091,047'System and method for implementing image-based design rules'20128,031,330'Mixed polarization state monitoring'20117,831,942'Design check database'20107,818,707'Fast pattern matching'20107,752,577'Constraint plus pattern'20107,707,542'Creating a situation repository'20107,661,087'Yield analysis with situations'20107,653,892'System and method for implementing image-based design rules'20107,648,802'Phase shifting test mask patterns for characterizing illumination and mask quality in image forming optical systems'20107,418,693'System and method for analysis and transformation of layouts using situations'20087,224,458'Phase-shifting test mask patterns for characterizing illumination polarization balance in image forming optical systems'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2014Based in El Cerrito, CA, US· patent location history
2008–2014Patents assigned to CADENCE DESIGN SYSTEMS INC (12)· patent assignee history
2010Based in Kensington, CA, US· patent location history
2011–2015Patents assigned to IBM (8)· patent assignee history
2011–2016Based in Clifton Park, NY, US· patent location history
2012–2016Patents assigned to MCINTYRE GREGORY R (10)· patent assignee history
2012–2014Patents assigned to GENNARI FRANK E (5)· patent assignee history
2012–2014Patents assigned to LAI YA-CHIEH (5)· patent assignee history
2013–2014Based in Hopewell Junction, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CADENCE DESIGN SYSTEMS INC | 12 | 2008–2014 |
| MCINTYRE GREGORY Rself | 10 | 2012–2016 |
| IBM | 8 | 2011–2015 |
| GENNARI FRANK E | 5 | 2012–2014 |
| LAI YA-CHIEH | 5 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| El Cerrito, California, US | 13 | 2007–2014 |
| Clifton Park, New York, US | 7 | 2011–2016 |
| Hopewell Junction, New York, US | 2 | 2013–2014 |
| Kensington, California, US | 1 | 2010 |