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Inventor

TOMOYUKI ANDO

Inventor
JP

Overview

2→
Patents
2022
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
B29CShaping or joining of plastics13%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form13%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients13%
C08LCompositions of macromolecular compounds13%
C09DCoating compositions, e.g. paints, varnishes or lacquers13%
C09JAdhesives13%
PatentTitleYear
11,491,772Substrate bonding method and laminated body production method202211,415,888Negative type photosensitive resin composition, photosensitive resist film, pattern forming method, cured film, and method of producing cured film2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022Patents assigned to TOKYO OHKA KOGYO CO LTD (2)· patent assignee history
2022Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO OHKA KOGYO CO LTD22022
Locations
LocationPatentsSpan
JP22022