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Inventor

Nagura Shigehiro

Inventor
Nishikamo-gun, JP

Overview

3→
Patents
2000–2003
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds30%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests30%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds10%
PatentTitleYear
6,613,844'Styrene polymer, chemically amplified positive resist composition and patterning process'20036,384,169'Styrene polymer, chemically amplified positive resist composition and patterning process'20026,136,502'Resist composition and patterning process'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2003Patents assigned to SHINETSU CHEMICAL CO (3)· patent assignee history
2000–2003Based in Nishikamo-gun, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHINETSU CHEMICAL CO32000–2003
Locations
LocationPatentsSpan
Nishikamo-gun, JP32000–2003