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Inventor

Markku Lager

Inventor
DE

Overview

2→
Patents
2023–2024
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H05Kprimary
H05KPrinted circuits33%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium17%
C23CCoating metallic material17%
C23FNon-mechanical removal of metallic material from surface17%
C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis17%
PatentTitleYear
11,963,308Method for increasing adhesion strength between a surface of copper or copper alloy and an organic layer202411,603,378Azole silane compound2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2024Patents assigned to ATOTECH DEUTSCHLAND GMBH (2)· patent assignee history
2023–2024Based in DE· patent location history
2024Patents assigned to ATOTECH DEUTSCHLAND GMBH & CO KG (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ATOTECH DEUTSCHLAND GMBH22023–2024
ATOTECH DEUTSCHLAND GMBH & CO KG12024
Locations
LocationPatentsSpan
DE22023–2024