Inventor
Kevin J. Moeggenborg
Inventor
Naperville, IL, US
Overview
Patents· 33 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Gprimary
C09GPolishing compositions16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
C09KMaterials for miscellaneous applications, not provided for elsewhere14%
C04BLime, magnesia11%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
B24BMachines, devices, or processes for grinding or polishing5%
C02FTreatment of water, waste water, sewage, or sludge4%
H01LSemiconductor devices4%
H10DInorganic electric semiconductor devices4%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
PatentTitleYear
10,002,760Method for manufacturing SiC wafer fit for integration with power device manufacturing technology20189,303,187'Compositions and methods for CMP of silicon oxide, silicon nitride, and polysilicon materials'20169,279,192'Method for manufacturing SiC wafer fit for integration with power device manufacturing technology'20168,691,695'CMP compositions and methods for suppressing polysilicon removal rates'20148,597,538'Composition for improving dryness during wire sawing'20138,251,777'Polishing slurry for aluminum and aluminum alloys'20128,101,093'Chemical-mechanical polishing composition and method for using the same'20127,998,866'Silicon carbide polishing method utilizing water-soluble oxidizers'20117,754,098'Chemical-mechanical polishing composition and method for using the same'20107,678,700'Silicon carbide polishing method utilizing water-soluble oxidizers'20107,485,241'Chemical-mechanical polishing composition and method for using the same'20097,306,637'Anionic abrasive particles treated with positively charged polyelectrolytes for CMP'20077,255,810'Polishing system comprising a highly branched polymer'20077,004,819'CMP systems and methods utilizing amine-containing polymers'20066,974,777'CMP compositions for low-k dielectric materials'20056,936,543'CMP method utilizing amphiphilic nonionic surfactants'20056,841,479'Method of reducing in-trench smearing during polishing'20056,776,810'Anionic abrasive particles treated with positively charged polyelectrolytes for CMP'20046,589,100'Rare earth salt/oxidizer-based CMP method'20036,527,622'CMP method for noble metals'20036,153,106'Method for inhibiting the formation and deposition of silica scale in water systems'20006,075,082'Cross-linked polymide binders for ceramics manufacture'20006,060,318'Tracing of process additives in industrial ceramics applications'20006,005,040'Preparation and utility of water-soluble polymers having pendant derivatized amide, ester or ether functionalities as ceramics dispersants and binders'19995,922,801'Polyamide binders for ceramics manufacture'19995,908,889'Polyamide binders for ceramics manufacture'19995,880,237'Preparation and utility of water-soluble polymers having pendant derivatized amide, ester or ether functionalities as ceramics dispersants and binders'19995,726,267'Preparation and utility of water-soluble polymers having pendant derivatized amide, ester or ether functionalities as ceramics dispersants and binders'19985,525,665'Co-polymer containing compositions for ceramic processing'19965,487,855'Polymeric binders for enhancing green strength of pressed ceramics'19965,358,911'Polymeric binders for ceramic processing'19945,308,807'Production of lead zirconate titanates using zirconia sol as a reactant'19945,168,082'Functionalized colloidal silica sol as a ceramics additive'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–2000Patents assigned to NALCO CHEMICAL CO (13)· patent assignee history
1992–2010Based in Aurora, IL, US· patent location history
1996–2014Based in Naperville, IL, US· patent location history
2003–2016Patents assigned to CABOT MICROELECTRONICS CORP (18)· patent assignee history
2012–2014Patents assigned to MOEGGENBORG KEVIN (3)· patent assignee history
2012Patents assigned to BRUSIC VLASTA (2)· patent assignee history
2012–2014Patents assigned to DE REGE THESAURO FRANCESCO (2)· patent assignee history
2016–2018Based in Midland, MI, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CABOT MICROELECTRONICS CORP | 18 | 2003–2016 |
| NALCO CHEMICAL CO | 13 | 1992–2000 |
| MOEGGENBORG KEVINself | 3 | 2012–2014 |
| BRUSIC VLASTA | 2 | 2012 |
| DE REGE THESAURO FRANCESCO | 2 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Naperville, Illinois, US | 25 | 1996–2014 |
| Aurora, Illinois, US | 5 | 1992–2010 |
| Midland, MI, US | 3 | 2016–2018 |