Inventor
Yoshihide Kihara
Inventor
Miyagi, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
H01LSemiconductor devices27%
H01JElectric discharge tubes or discharge lamps19%
C23CCoating metallic material6%
H05HPlasma technique6%
C09KMaterials for miscellaneous applications, not provided for elsewhere5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
H10BElectronic memory devices2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
H10DInorganic electric semiconductor devices1%
PatentTitleYear
10,886,136Method for processing substrates202110,777,422Method for processing target object202010,763,123Method for processing workpiece202010,714,340Method for processing workpiece202010,685,848Workpiece processing method202010,586,710Etching method202010,566,209Etching method and workpiece processing method202010,559,472Workpiece processing method202010,553,446Method of processing target object202010,504,745Method for processing target object201910,475,659Method of processing target object201910,460,963Plasma processing method201910,381,236Method of processing target object201910,233,535Plasma processing apparatus and plasma processing method201910,217,643Method of processing target object20199,911,607'Method of processing target object'20189,911,622'Method of processing target object'20189,859,126'Method for processing target object'20189,721,766'Method for processing target object'20179,607,811'Workpiece processing method'20179,583,361'Method of processing target object and plasma processing apparatus'20179,502,219'Plasma processing method'20169,330,935'Plasma etching method and plasma etching apparatus'20167,326,650'Method of etching dual damascene structure'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2021Patents assigned to TOKYO ELECTRON LTD (24)· patent assignee history
2008Based in Hsinchu, TW· patent location history
2016–2021Based in Miyagi, JP· patent location history
2020Patents assigned to TOKYO ELECTON LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 24 | 2008–2021 |
| TOKYO ELECTON LTD | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Miyagi, JP | 23 | 2016–2021 |
| Hsinchu, TW | 1 | 2008 |