Inventor
Peter A. Agostino
Inventor
Canaan, NY, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%
C04BLime, magnesia19%
H05KPrinted circuits19%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
C08JWorking-up6%
PatentTitleYear
5,370,974'Laser exposure of photosensitive polyimide for pattern formation'19945,277,725'Process for fabricating a low dielectric composite substrate'19945,270,151'Spin on oxygen reactive ion etch barrier'19935,262,273'Photosensitive reactive ion etch barrier'19935,215,861'Thermographic reversible photoresist'19935,135,595'Process for fabricating a low dielectric composite substrate'19924,735,820'Removal of residual catalyst from a dielectric substrate'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–1994Patents assigned to IBM (7)· patent assignee history
1988–1994Based in Canaan, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 7 | 1988–1994 |
Locations
| Location | Patents | Span |
|---|---|---|
| Canaan, New York, US | 7 | 1988–1994 |