Inventor

Chihhsiang Hsiao

Inventor

Iwate, JP

Overview

2019–2021

Patent span

Electricity

Primary field (CPC H)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary

C23CCoating metallic material17%

H01LSemiconductor devices17%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%

B05DProcesses for applying fluent materials to surfaces, in general8%

H01JElectric discharge tubes or discharge lamps8%

H02MApparatus for conversion between ac and ac, between ac and dc, or between dc and dc, and for use with mains or similar power supply systems8%

H02PControl or regulation of electric motors, electric generators or dynamo-electric converters8%

H10KOrganic electric solid-state devices8%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2019Patents assigned to TOKYO ELECTRON LTD (2)· patent assignee history

2019Based in Iwate, JP· patent location history

2021Patents assigned to DELTA ELECTRONICS INC (1)· patent assignee history

2021Based in Taoyuan, TW· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOKYO ELECTRON LTD	2	2019
DELTA ELECTRONICS INC	1	2021

Locations

Location	Patents	Span
Iwate, JP	2	2019
Taoyuan, TW	1	2021