Inventor

Thomas Poiesz

Inventor
Veldhoven, NL

Overview

12→
Patents
2017–2021
Patent span
Physics
Primary field (CPC G)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H01LSemiconductor devices15%
B01DSeparation6%
B05BSpraying apparatus6%
F23JRemoval or treatment of combustion products or combustion residues6%
Y02CCapture, storage, sequestration or disposal of greenhouse gases [ghg]6%
B23HWorking of metal by the action of a high concentration of electric current on a workpiece using an electrode which takes the place of a tool3%
H02NElectric machines not otherwise provided for3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017–2021Patents assigned to ASML NETHERLANDS BV (12)· patent assignee history
2017–2021Based in Veldhoven, NL· patent location history
2020Patents assigned to ASML HOLDING NV (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV122017–2021
ASML HOLDING NV22020
Locations
LocationPatentsSpan
Veldhoven, NL122017–2021