Inventor

David N. McIlroy

Inventor
Moscow, ID, US

Overview

7→
Patents
1992–2020
Patent span
General tagging of new technological developments
Primary field (CPC Y)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary
B82YSpecific uses or applications of nanostructures13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution9%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry6%
C01BNon-metallic elements6%
C02FTreatment of water, waste water, sewage, or sludge6%
H01GCapacitors6%
H01JElectric discharge tubes or discharge lamps6%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy6%
Y02PClimate change mitigation technologies in the production or processing of goods6%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992Patents assigned to MARS INC (1)· patent assignee history
1992Based in Geel, BE· patent location history
1996–2001Patents assigned to UNIV NEBRASKA (2)· patent assignee history
1996Based in Lincoln, NE, US· patent location history
2001–2013Patents assigned to IDAHO RES FOUND (2)· patent assignee history
2001–2020Based in Moscow, ID, US· patent location history
2013Patents assigned to MCILROY DAVID (1)· patent assignee history
2017–2020Patents assigned to UNIV OF IDAHO (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IDAHO RES FOUND22001–2013
UNIV NEBRASKA21996–2001
UNIV OF IDAHO22017–2020
MARS INC11992
MCILROY DAVIDself12013
Locations
LocationPatentsSpan
Moscow, ID, US52001–2020
Lincoln, NE, US11996
Geel, BE11992