Inventor
Linda Lindroos
Inventor
Helsinki, FI
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C23FNon-mechanical removal of metallic material from surface20%
H10DInorganic electric semiconductor devices20%
C23CCoating metallic material5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
PatentTitleYear
10,699,899Atomic layer deposition of antimony oxide films202010,643,925Fluorine-containing conductive films202010,056,249Atomic layer deposition of antimony oxide films20189,514,934'Atomic layer deposition of antimony oxide films'20169,006,112'Atomic layer deposition of antimony oxide films'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015Patents assigned to ASM INT (1)· patent assignee history
2015–2020Based in Helsinki, FI· patent location history
2016–2020Patents assigned to ASM INT NV (3)· patent assignee history
2020Patents assigned to ASM IP HOLDING BV (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASM INT NV | 3 | 2016–2020 |
| ASM INT | 1 | 2015 |
| ASM IP HOLDING BV | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Helsinki, FI | 5 | 2015–2020 |