Inventor

Wen-Chuan Wang

Inventor

Hsinchu, TW

Overview

2002–2020

Patent span

Physics

Primary field (CPC G)

Patents· 60 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%

H01JElectric discharge tubes or discharge lamps12%

G06FElectric digital data processing10%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%

H01LSemiconductor devices8%

B82YSpecific uses or applications of nanostructures6%

H10DInorganic electric semiconductor devices5%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%

G03HHolographic processes or apparatus3%

G09GArrangements or circuits for control of indicating devices using static means to present variable information3%

PatentTitleYear

10,811,225Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity2020 10,495,982System and method for real-time overlay error reduction2019 10,431,423Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity2019 10,359,695Method of fabricating an integrated circuit with non-printable dummy features2019 10,175,820Verification apparatus and verification method for touch display panel2019 10,170,276Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity2019 10,008,171Gate driving circuit with isolating switch for display device using the same2018 9,966,032Driving circuit and driving method2018 9,870,612'Method for repairing a mask'2018 9,810,994'Systems and methods for high-throughput and small-footprint scanning exposure for lithography'2017 9,792,869'Display panel'2017 9,761,411'System and method for maskless direct write lithography'2017 9,678,434'Grid refinement method'2017 9,658,538'System and technique for rasterizing circuit layout data'2017 9,594,862'Method of fabricating an integrated circuit with non-printable dummy features'2017 9,589,764'Electron beam lithography process with multiple columns'2017 9,552,964'Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity'2017 9,529,271'Grid refinement method'2016 9,519,225'Systems and methods for high-throughput and small-footprint scanning exposure for lithography'2016 9,436,787'Method of fabricating an integrated circuit with optimized pattern density uniformity'2016 9,436,788'Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformity'2016 9,329,488'Grid refinement method'2016 9,229,332'Systems and methods for high-throughput and small-footprint scanning exposure for lithography'2016 9,182,660'Methods for electron beam patterning'2015 9,176,389'Grid refinement method'2015 9,134,627'Multiple-patterning overlay decoupling method'2015 9,064,754'Capacitor structure of gate driver in panel'2015 8,984,452'Long-range lithographic dose correction'2015 8,972,908'Method for electron beam proximity correction with improved critical dimension accuracy'2015 8,946,716'Capacitor structure of gate driver in panel'2015 8,927,947'Systems and methods providing electron beam writing to a medium'2015 8,852,849'Electron beam lithography system and method for improving throughput'2014 8,846,278'Electron beam lithography system and method for improving throughput'2014 8,828,632'Multiple-grid exposure method'2014 8,822,107'Grid refinement method'2014 8,822,106'Grid refinement method'2014 8,758,963'Holographic reticle and patterning method'2014 8,610,083'Systems and methods providing electron beam writing to a medium'2013 8,584,057'Non-directional dithering methods'2013 8,530,121'Multiple-grid exposure method'2013 8,524,427'Electron beam lithography system and method for improving throughput'2013 8,510,687'Error diffusion and grid shift in lithography'2013 8,368,037'Systems and methods providing electron beam writing to a medium'2013 8,227,150'Holographic reticle and patterning method'2012 8,120,032'Active device array substrate and fabrication method thereof'2012 8,046,860'System and method for removing particles in semiconductor manufacturing'2011 7,824,316'Punching bag'2010 7,819,980'System and method for removing particles in semiconductor manufacturing'2010 7,796,249'Mask haze early detection'2010 7,759,136'Critical dimension (CD) control by spectrum metrology'2010 7,722,997'Holographic reticle and patterning method'2010 7,697,114'Method and apparatus for compensated illumination for advanced lithography'2010 7,474,788'Method and system for enhancing image resolution using a modification vector'2009 7,460,251'Dimension monitoring method and system'2008 7,383,530'System and method for examining mask pattern fidelity'2008 7,316,872'Etching bias reduction'2008 7,312,021'Holographic reticle and patterning method'2007 7,060,400'Method to improve photomask critical dimension uniformity and photomask fabrication process'2006 6,721,939'Electron beam shot linearity monitoring'2004 6,379,849'Method for forming binary intensity masks'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (34)· patent assignee history

2002–2009Based in Tainan, TW· patent location history

2004–2011Based in Taipei, TW· patent location history

2007–2020Based in Hsinchu, TW· patent location history

2012–2015Patents assigned to WANG WEN-CHUAN (9)· patent assignee history

2012–2019Patents assigned to CHUNGHWA PICTURE TUBES LTD (7)· patent assignee history

2012Based in Taoyuan County, TW· patent location history

2013–2015Patents assigned to LIN BURN JENG (7)· patent assignee history

2015–2019Based in New Taipei, TW· patent location history

2016–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (17)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG	34	2002–2016
TAIWAN SEMICONDUCTOR MFG CO LTD	17	2016–2020
WANG WEN-CHUANself	9	2012–2015
CHUNGHWA PICTURE TUBES LTD	7	2012–2019
LIN BURN JENG	7	2013–2015

Locations

Location	Patents	Span
Hsinchu, TW	43	2007–2020
Taipei, TW	8	2004–2011
New Taipei, TW	6	2015–2019
Tainan, TW	2	2002–2009
Taoyuan County, TW	1	2012