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Inventor

Ivan Pollentier

Inventor
Langdorp, BE

Overview

4→
Patents
2009–2021
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
B82YSpecific uses or applications of nanostructures13%
C01BNon-metallic elements13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
Y10TTechnical subjects covered by former us classification13%
PatentTitleYear
11,092,886Method for forming a pellicle202110,712,659Method for forming a carbon nanotube pellicle membrane20209,086,638'Detection of contamination in EUV systems'20157,528,387'Methods and systems for characterising and optimising immersion lithographic processing'2009

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2009Patents assigned to IMEC INTER UNI MICRO ELECTR (1)· patent assignee history
2009–2021Based in Langdorp, BE· patent location history
2015Patents assigned to GOETHALS ANNE-MARIE (1)· patent assignee history
2015Patents assigned to IMEC (1)· patent assignee history
2020–2021Patents assigned to IMEC VZW (2)· patent assignee history
2020–2021Patents assigned to Imec USA Nanoelectronics Design Center (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IMEC VZW22020–2021
Imec USA Nanoelectronics Design Center22020–2021
GOETHALS ANNE-MARIE12015
IMEC12015
IMEC INTER UNI MICRO ELECTR12009
Locations
LocationPatentsSpan
Langdorp, BE42009–2021