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Inventor

Tony Sica

Inventor
Mount Vernon, NY, US

Overview

4→
Patents
2000–2002
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material33%
B22FWorking metallic powder17%
F27DDetails or accessories of furnaces, kilns, ovens or retorts, in so far as they are of kinds occurring in more than one kind of furnace17%
H01FMagnets17%
H01JElectric discharge tubes or discharge lamps17%
PatentTitleYear
6,342,114'Nickel/vanadium sputtering target with ultra-low alpha emission'20026,283,357'Fabrication of clad hollow cathode magnetron sputter targets'20016,175,103'Automated heat treatment furnace'20016,010,583'Method of making unreacted metal/aluminum sputter target'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000Patents assigned to MATERIALS RESEARCH CORP (1)· patent assignee history
2000Patents assigned to SONY CORP (1)· patent assignee history
2000–2002Based in Mount Vernon, NY, US· patent location history
2001–2002Patents assigned to PRAXAIR TECHNOLOGY INC (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
PRAXAIR TECHNOLOGY INC32001–2002
MATERIALS RESEARCH CORP12000
SONY CORP12000
Locations
LocationPatentsSpan
Mount Vernon, New York, US42000–2002