LexDanaLexDanabeta
Inventor

Yukihiro Furukawa

Inventor
Hadano, JP

Overview

2→
Patents
2000–2006
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C02Fprimary
C02FTreatment of water, waste water, sewage, or sludge33%
A61LMethods or apparatus for sterilising materials or objects in general17%
B01DSeparation17%
B24BMachines, devices, or processes for grinding or polishing17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
PatentTitleYear
7,018,529'System for producing ultrapure water'20066,077,437'Device and method for recovering and reusing a polishing agent'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2006Patents assigned to KURITA WATER IND LTD (2)· patent assignee history
2000Patents assigned to NEC CORP (1)· patent assignee history
2000Based in Tokyo, JP· patent location history
2006Based in Hadano, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KURITA WATER IND LTD22000–2006
NEC CORP12000
Locations
LocationPatentsSpan
Hadano, JP12006
Tokyo, JP12000