Inventor

Kenji Saitoh

Inventor

Yokohama, JP

Overview

1989–2016

Patent span

Physics

Primary field (CPC G)

Patents· 79 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%

G01BMeasuring length, thickness or similar linear dimensions7%

G01NInvestigating or analysing materials by determining their chemical or physical properties5%

H10BElectronic memory devices5%

G02BOptical elements, systems or apparatus4%

B82YSpecific uses or applications of nanostructures3%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%

H10DInorganic electric semiconductor devices3%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%

G01DMeasuring not specially adapted for a specific variable3%

PatentTitleYear

9,389,067'Three-dimensional shape measuring apparatus, three-dimensional shape measuring method, program, and storage medium'2016 8,497,995'Measurement apparatus and method for measuring surface shape and roughness'2013 8,456,621'Measurement system and measurement processing method'2013 8,437,003'Information processing apparatus and method'2013 8,274,646'Measurement system and measurement processing method'2012 7,988,309'Corner cube member illumination device and inspection system having the same'2011 7,965,917'Illuminating apparatus and surface inspection system using illuminating apparatus'2011 7,957,636'Illumination apparatus and appearance inspection apparatus including the same'2011 7,924,418'Inspection apparatus and method'2011 7,901,098'Illuminating apparatus and image sensing system including illuminating apparatus'2011 7,605,860'Image pickup optical system'2009 7,508,417'Wireless imaging apparatus and its control method'2009 7,402,378'Exposure method and apparatus'2008 7,399,558'Mask and manufacturing method thereof and exposure method'2008 7,277,125'Image processing system, method and program for image sensing using plural image sensing devices, wirelessly transmitting plural image data and processing the image data'2007 7,217,503'Exposure method and apparatus'2007 7,214,453'Mask and its manufacturing method, exposure, and device fabrication method'2007 7,107,573'Method for setting mask pattern and illumination condition'2006 7,075,455'Wireless communication apparatus and method'2006 6,991,877'Exposure method and apparatus'2006 6,842,255'Interferometer and interferance measurement method'2005 6,839,890'Mask manufacturing method'2005 6,828,085'Exposure method and device manufacturing method using the same'2004 6,829,091'Optical system and optical instrument with diffractive optical element'2004 6,544,721'Multiple exposure method'2003 6,534,242'Multiple exposure device formation'2003 6,403,291'Multiple exposure method'2002 6,221,541'Device manufacturing method and apparatus utilizing concentric fan-shaped pattern mask'2001 6,157,452'Position detecting apparatus'2000 6,154,281'Position detecting system and device manufacturing method using the same'2000 6,083,650'Device manufacturing method utilizing concentric fan-shaped pattern mask'2000 6,060,739'Non-volatile semiconductor memory device having a floating gate inside a grove'2000 5,985,720'Method of making non-volatile semiconductor memory device with the floating gate having upper and lower impurity concentrations'1999 5,946,593'Semiconductor device manufacturing method'1999 5,891,773'Non-volatile semiconductor storage apparatus and production thereof'1999 5,846,861'Method of manufacturing non-volatile semiconductor memory having erasing gate'1998 5,825,690'Semiconductor non-volatile storage device having verification potential applying device for re-writing to insufficiently written memory cells'1998 5,822,389'Alignment apparatus and SOR X-ray exposure apparatus having same'1998 5,751,426'Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object'1998 5,721,721'Two scanning probes information recording/reproducing system with one probe to detect atomic reference location on a recording medium'1998 5,717,492'Position detecting apparatus and a method for manufacturing semiconductor devices using the apparatus'1998 5,682,239'Apparatus for detecting positional deviation of diffraction gratings on a substrate by utilizing optical heterodyne interference of light beams incident on the gratings from first and second light emitters'1997 5,670,809'Non-volatile semiconductor memory device'1997 5,625,453'System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating'1997 5,610,718'Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes'1997 5,585,923'Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means'1996 5,550,635'Rotational deviation detecting method and system using a periodic pattern'1996 5,523,976'Non-volatile semiconductor memory device having a memory cell group operative as a redundant memory cell group for replacement of another group'1996 5,524,131'Alignment apparatus and SOR x-ray exposure apparatus having same'1996 5,519,686'Encoder for controlling measurements in the range of a few angstroms'1996 5,502,669'Electrically erasable and programmable read only memory device having selectively erasable sectors'1996 5,483,343'Wavelength compensator in a helium ambience'1996 5,481,363'Positional deviation detecting method'1996 5,455,679'Position detecting system'1995 5,396,335'Position detecting method'1995 5,377,009'Alignment method'1994 5,369,486'Position detector for detecting the position of an object using a diffraction grating positioned at an angle'1994 5,343,291'Method and apparatus for measuring an interval between two objects'1994 5,332,692'Method of manufacturing a semiconductor device having a polycide structure'1994 5,333,050'Measuring method and apparatus for meausring the positional relationship of first and second gratings'1994 5,327,221'Device for detecting positional relationship between two objects'1994 5,325,176'Position detecting method and apparatus including Fraunhofer diffraction detector'1994 5,319,444'Position detecting method and apparatus'1994 5,313,272'Method and apparatus for measuring deviation between patterns on a semiconductor wafer'1994 5,294,980'Positioning detecting method and apparatus'1994 5,285,259'Position detecting method'1994 5,235,408'Position detecting method and apparatus'1993 5,229,617'Position detecting method having reflectively scattered light prevented from impinging on a detector'1993 5,200,800'Position detecting method and apparatus'1993 5,196,711'Deviation measuring device including a mask having a grating pattern and a zone plate pattern'1993 5,162,656'Position detecting device employing marks and oblique projection'1992 5,160,848'Device for detecting the relative position between opposed first and second objects'1992 5,148,036'Multi-axis wafer position detecting system using a mark having optical power'1992 5,114,236'Position detection method and apparatus'1992 4,895,914'Surface treated polymethylsilsesquioxane powder'1990 4,896,204'Semiconductor device and method of manufacturing thereof'1990 4,863,832'Optical recording employing diacetylene compound and dye to change color and form pits'1989 4,835,083'Method for patterning electroconductive film and patterned electroconductive film'1989 4,798,740'Polymerizable film and pattern forming method by use thereof'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–2016Patents assigned to CANON KK (66)· patent assignee history

1989–1998Based in Yokohama, JP· patent location history

1989–2016Based in Tokyo, JP· patent location history

1995–2013Based in Atsugi, JP· patent location history

1996–2000Patents assigned to NEC CORP (8)· patent assignee history

2000–2004Based in Utsunomiya, JP· patent location history

2005–2009Based in Tochigi, JP· patent location history

2012–2013Patents assigned to MATSUGU MASAKAZU (4)· patent assignee history

2012–2013Patents assigned to OTA KAZUYUKI (4)· patent assignee history

2012–2013Patents assigned to SAITOH KENJI (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CANON KK	66	1989–2016
NEC CORP	8	1996–2000
MATSUGU MASAKAZU	4	2012–2013
OTA KAZUYUKI	4	2012–2013
SAITOH KENJIself	4	2012–2013

Locations

Location	Patents	Span
Yokohama, JP	28	1989–1998
Atsugi, JP	15	1995–2013
Tokyo, JP	14	1989–2016
Tochigi, JP	10	2005–2009
Utsunomiya, JP	8	2000–2004