Inventor
Chia-Ching Huang
Inventor
Su-ao Township, TW
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
H01LSemiconductor devices18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
G06FElectric digital data processing7%
H10DInorganic electric semiconductor devices5%
Y10TTechnical subjects covered by former us classification5%
A47BTables3%
C23CCoating metallic material3%
H04WWireless communication networks3%
H05GX-ray technique3%
PatentTitleYear
11,116,316Supporting device for rail member202111,064,808Rack system202110,545,694Methods for controlling data transfer speed of a data storage device and a host device utilizing the same202010,424,659High electron mobility transistor201910,405,255Dynamic crossband link method and wireless extender201910,372,861Method of macro placement and a non-transitory computer readable medium thereof201910,256,332High hole mobility transistor201910,002,956High electron mobility transistor20189,942,827Dynamic crossband link method and wireless extender20189,869,934'Collector in an extreme ultraviolet lithography system with optimal air curtain protection'20189,735,065'Systems and methods of local focus error compensation for semiconductor processes'20179,618,856'Method of overlay in extreme ultra-violet (EUV) lithography'20179,558,944'System, method and reticle for improved pattern quality in extreme ultraviolet (EUV) lithography and method for forming the reticle'20179,548,209'Method for integrated circuit fabrication'20179,476,764'Wavefront adjustment in extreme ultra-violet (EUV) lithography'20169,405,204'Method of overlay in extreme ultra-violet (EUV) lithography'20169,377,693'Collector in an extreme ultraviolet lithography system with optimal air curtain protection'20169,214,373'Chuck exhaust openings'20159,046,776'System, method and reticle for improved pattern quality in extreme ultraviolet (EUV) lithography and method for forming the reticle'20159,034,665'Tool configuration and method for extreme ultra-violet (EUV) patterning with a deformable reflective surface'20159,003,337'Systems and methods of local focus error compensation for semiconductor processes'20158,980,108'Method for integrated circuit fabrication'20158,052,004'Releasable lockable lid'2011D0643040'Electrical card'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2018Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (10)· patent assignee history
2015–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (3)· patent assignee history
2015–2017Based in Su-ao Township, TW· patent location history
2015–2018Based in Yilan County, TW· patent location history
2018–2019Patents assigned to VANGUARD INT SEMICONDUCT CORP (3)· patent assignee history
2018–2019Based in Taoyuan, TW· patent location history
2018–2019Based in Penghu County, TW· patent location history
2021Patents assigned to KING SLIDE TECHNOLOGY CO LTD (2)· patent assignee history
2021Patents assigned to KING SLIDE WORKS CO LTD (2)· patent assignee history
2021Based in Kaohsiung, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 10 | 2015–2018 |
| TAIWAN SEMICONDUCTOR MFG | 3 | 2015–2016 |
| VANGUARD INT SEMICONDUCT CORP | 3 | 2018–2019 |
| KING SLIDE TECHNOLOGY CO LTD | 2 | 2021 |
| KING SLIDE WORKS CO LTD | 2 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Su-ao Township, TW | 8 | 2015–2017 |
| Yilan County, TW | 5 | 2015–2018 |
| Taoyuan, TW | 3 | 2018–2019 |
| Kaohsiung, TW | 2 | 2021 |
| Penghu County, TW | 2 | 2018–2019 |