Inventor
Akihiko Tsuzumitani
Inventor
Osaka, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices43%
H10BElectronic memory devices26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
8,242,567'Semiconductor device and manufacturing method thereof'20127,973,367'Semiconductor device and manufacturing method thereof'20117,879,661'Semiconductor device and method for fabricating the same'20117,663,191'Semiconductor device and manufacturing method thereof with rounded gate including a silicide on the top and at the corners'20107,361,932'Semiconductor device and method for fabricating the same'20087,202,095'Method for measuring silicide proportion, method for measuring annealing temperature, method for fabricating semiconductor device and x-ray photo receiver'20076,916,705'Semiconductor memory and method for fabricating the same'20056,884,674'Method for fabricating a semiconductor device including a capacitance insulating film having a perovskite structure'20056,784,474'Semiconductor memory device and method for fabricating the same'20046,773,979'Method for fabricating semiconductor device'20046,762,445'DRAM memory cell with dummy lower electrode for connection between upper electrode and upper layer interconnect'20046,645,807'Method for manufacturing semiconductor device'20036,642,564'Semiconductor memory and method for fabricating the same'20036,531,729'Semiconductor device and method for fabricating the same'20036,436,786'Method for fabricating a semiconductor device'20026,265,262'Semiconductor device and method of fabricating the same'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2008Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (11)· patent assignee history
2001–2005Based in Osaka, JP· patent location history
2002Patents assigned to MATSUSHITA ELECTRONICS CORP (1)· patent assignee history
2004Based in Ibaraki, JP· patent location history
2007Based in Niigata, JP· patent location history
2008–2012Based in Kyoto, JP· patent location history
2010–2012Patents assigned to PANASONIC CORP (4)· patent assignee history
2012Patents assigned to IKEDA ATSUSHI (1)· patent assignee history
2012Patents assigned to KANEGAE KENSHI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MATSUSHITA ELECTRIC INDUSTRIAL CO LTD | 11 | 2001–2008 |
| PANASONIC CORP | 4 | 2010–2012 |
| IKEDA ATSUSHI | 1 | 2012 |
| KANEGAE KENSHI | 1 | 2012 |
| MATSUSHITA ELECTRONICS CORP | 1 | 2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Osaka, JP | 8 | 2001–2005 |
| Kyoto, JP | 5 | 2008–2012 |
| Ibaraki, JP | 2 | 2004 |
| Niigata, JP | 1 | 2007 |