Inventor
Sheng-Chi Chin
Inventor
Hsinchu, TW
Overview
Patents· 41 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices39%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H01LSemiconductor devices10%
B08BCleaning in general5%
G03HHolographic processes or apparatus4%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
A47LDomestic washing or cleaning2%
B05CApparatus for applying fluent materials to surfaces, in general2%
B05DProcesses for applying fluent materials to surfaces, in general2%
B82YSpecific uses or applications of nanostructures2%
PatentTitleYear
10,955,746Lithography method with reduced impacts of mask defects202110,859,908Method to fabricate mask-pellicle system202010,845,342Acoustic measurement of film thickness202010,794,872Acoustic measurement of fabrication equipment clearance202010,691,017Pellicle for advanced lithography202010,520,805System and method for localized EUV pellicle glue removal201910,126,644Pellicle for advanced lithography201810,061,193Focused radiation beam induced deposition20189,933,699Pellicle aging estimation and particle removal from pellicle via acoustic waves20189,915,866'Focused radiation beam induced deposition'20189,910,350'Method for repairing a mask'20189,889,477'Method and apparatus for enhanced cleaning and inspection'20189,870,612'Method for repairing a mask'20189,835,940Method to fabricate mask-pellicle system20179,658,526'Mask pellicle indicator for haze prevention'20179,418,847'Lithography system and method for haze elimination'20169,354,510'EUV mask and method for forming the same'20169,152,035'Lithographic photomask with inclined sides'20159,138,785'Method and apparatus for enhanced cleaning and inspection'20158,932,958'Device manufacturing and cleaning method'20158,906,583'Stacked mask'20148,758,963'Holographic reticle and patterning method'20148,737,717'Method and apparatus for defect identification'20148,709,682'Mask and method for forming the mask'20148,691,476'EUV mask and method for forming the same'20148,656,318'System and method for combined intraoverlay metrology and defect inspection'20148,626,580'Coupon-point system for managing supportive services to business in a semiconductor foundry environment'20148,609,545'Method to improve mask critical dimension uniformity (CDU)'20138,598,042'Device manufacturing and cleaning method'20138,227,150'Holographic reticle and patterning method'20127,999,910'System and method for manufacturing a mask for semiconductor processing'20117,722,997'Holographic reticle and patterning method'20107,697,114'Method and apparatus for compensated illumination for advanced lithography'20107,383,530'System and method for examining mask pattern fidelity'20087,381,344'Method to reduce particle level for dry-etch'20087,316,872'Etching bias reduction'20087,312,021'Holographic reticle and patterning method'20077,060,400'Method to improve photomask critical dimension uniformity and photomask fabrication process'20066,830,853'Chrome mask dry etching process to reduce loading effect and defects'20046,599,665'Method of making a semiconductor wafer imaging mask having uniform pattern features'20036,428,938'Phase-shift mask for printing high-resolution images and a method of fabrication'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (25)· patent assignee history
2002–2021Based in Hsinchu, TW· patent location history
2012–2015Patents assigned to CHIN SHENG-CHI (10)· patent assignee history
2012–2015Patents assigned to LU CHI-LUN (4)· patent assignee history
2013–2014Patents assigned to HSU TING-HAO (4)· patent assignee history
2013–2014Based in Jhubei City, TW· patent location history
2016–2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (16)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG | 25 | 2002–2016 |
| TAIWAN SEMICONDUCTOR MFG CO LTD | 16 | 2016–2021 |
| CHIN SHENG-CHIself | 10 | 2012–2015 |
| HSU TING-HAO | 4 | 2013–2014 |
| LU CHI-LUN | 4 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 37 | 2002–2021 |
| Jhubei City, TW | 4 | 2013–2014 |