Inventor
Kyoung Heun Shin
Inventor
Seongnam-si, KR
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C01Bprimary
C01BNon-metallic elements14%
C23CCoating metallic material14%
G06FElectric digital data processing14%
H01BCables14%
H01LSemiconductor devices14%
H10KOrganic electric solid-state devices14%
Y10TTechnical subjects covered by former us classification14%
PatentTitleYear
11,074,066Apparatus and method for managing software updates of electronic devices20219,236,156'Preparing method of reduced graphene oxide film using a chemical reduction method and a pressure-assisted thermal reduction method, reduced graphene oxide film prepared by the same, and graphene electrode including the reduced graphene oxide film'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016Patents assigned to SNU R&DB FOUNDATION (1)· patent assignee history
2016Based in Seoul, KR· patent location history
2021Patents assigned to SAMSUNG ELECTRONICS CO LTD (1)· patent assignee history
2021Based in Seongnam-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 1 | 2021 |
| SNU R&DB FOUNDATION | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seongnam-si, KR | 1 | 2021 |
| Seoul, KR | 1 | 2016 |