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Inventor

Hiroyuki Takahama

Inventor
Sawara, JP

Overview

5→
Patents
1996–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material29%
F04BPositive-displacement machines for liquids14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
LOC1514%
LOC2414%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
PatentTitleYear
D0904640Substrate carrier2020D0568914'Substrate support lift pin'20086,887,317'Reduced friction lift pin'20055,589,224'Apparatus for full wafer deposition'19965,548,964'Method and apparatus for cooling a vacuum device'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2020Patents assigned to APPLIED MATERIALS INC (5)· patent assignee history
1996–2008Based in Sawara, JP· patent location history
2020Based in Chiba, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC51996–2020
Locations
LocationPatentsSpan
Sawara, JP41996–2008
Chiba, JP12020