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Inventor

Naoya Nosaka

Inventor
Tokyo, JP

Overview

9→
Patents
2015–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds13%
B60CVehicle tyres11%
C08CTreatment or chemical modification of rubbers11%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients11%
C08LCompositions of macromolecular compounds9%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%
Y02TClimate change mitigation technologies related to transportation8%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
H01LSemiconductor devices6%
PatentTitleYear
11,126,084Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound202111,003,079Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound202110,961,327Method for producing hydrogenated conjugated diene-based polymer, hydrogenated conjugated diene-based polymer, polymer composition, cross-linked polymer, and tire202110,125,211Tire member, hydrogenated conjugated diene polymer, and polymer composition20189,958,781Method for film formation, and pattern-forming method20189,676,931'Polymer composition, crosslinked polymer, tire, and polymer'20179,527,932'Method for producing denatured conjugated diene polymer'20169,090,754'Method for producing denatured conjugated diene polymer'20158,980,987'Method for producing modified conjugated diene rubber, modified conjugated diene rubber, and rubber composition'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015–2021Patents assigned to JSR CORP (9)· patent assignee history
2015–2016Patents assigned to NOSAKA NAOYA (3)· patent assignee history
2015–2016Patents assigned to TANAKA RYOUJI (3)· patent assignee history
2015–2016Patents assigned to MORITA HIROYUKI (2)· patent assignee history
2015–2016Patents assigned to TANI KOICHIRO (2)· patent assignee history
2015–2021Based in Tokyo, JP· patent location history
2017–2021Based in Minato-ku, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP92015–2021
NOSAKA NAOYAself32015–2016
TANAKA RYOUJI32015–2016
MORITA HIROYUKI22015–2016
TANI KOICHIRO22015–2016
Locations
LocationPatentsSpan
Tokyo, JP72015–2021
Minato-ku, JP22017–2021