Inventor
Erik Roelof Loopstra
Inventor
Heeze, NL
Overview
Patents· 330 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices51%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
G02BOptical elements, systems or apparatus6%
H05GX-ray technique5%
G21KHandling of particles or ionising radiation not otherwise provided for3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
B82YSpecific uses or applications of nanostructures3%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
H02KDynamo-electric machines1%
PatentTitleYear
11,009,803Mask assembly202111,003,098Pellicle attachment apparatus202110,969,701Pellicle attachment apparatus202110,962,891Lithographic apparatus and device manufacturing method202110,908,508Position measurement of optical elements in a lithographic apparatus202110,884,339Lithographic method202110,838,310Lithographic apparatus and device manufacturing method involving a heater202010,788,755Lithographic apparatus and device manufacturing method202010,761,438Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets202010,732,511Projection system and mirror and radiation source for a lithographic apparatus202010,678,139Lithographic apparatus and device manufacturing method202010,620,545Lithographic apparatus and device manufacturing method2020RE047943Dual stage lithographic apparatus and device manufacturing method202010,599,051Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus202010,580,545Beam delivery apparatus and method202010,558,129Mask assembly202010,539,886Pellicle attachment apparatus202010,527,955Lithographic apparatus and device manufacturing method202010,509,325Position measurement of optical elements in a lithographic apparatus201910,503,084Lithographic apparatus and device manufacturing method201910,481,510Graphene spectral purity filter201910,481,500Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type201910,466,595Lithographic apparatus and device manufacturing method201910,437,154Lithographic method201910,345,712Lithographic apparatus and device manufacturing method201910,261,428Lithographic apparatus and device manufacturing method201910,254,663Lithographic apparatus and device manufacturing method involving a heater201910,248,034Lithographic apparatus and device manufacturing method201910,222,706Lithographic apparatus and device manufacturing method201910,216,101Reflector201910,216,093Projection system and minor and radiation source for a lithographic apparatus201910,191,389Lithographic apparatus and device manufacturing method201910,180,629Lithographic apparatus and device manufacturing method201910,146,142Lithographic apparatus and device manufacturing method201810,103,508Electron injector and free electron laser201810,031,428Gas flow optimization in reticle stage environment2018RE046933Dual stage lithographic apparatus and device manufacturing method201810,001,709Lithographic apparatus, spectral purity filter and device manufacturing method20189,989,844Pellicle for reticle and multilayer mirror20189,983,482Radiation collector, radiation source and lithographic apparatus20189,986,628Method and apparatus for generating radiation20189,958,787Lithographic method and apparatus20189,952,515Lithographic apparatus and device manufacturing method20189,952,513Undulator20189,933,707Optical apparatus for use in photolithography20189,910,368'Patterning device manipulating system and lithographic apparatuses'20189,885,965'Lithographic apparatus and device manufacturing method'20189,853,412Radiation source20179,823,572'Lithographic method'20179,798,246'Lithographic apparatus and device manufacturing method'20179,753,381'Substrate table system, lithographic apparatus and substrate table swapping method'20179,740,107'Lithographic apparatus and device manufacturing method'20179,726,989'Spectral purity filter'20179,728,931'Electron injector and free electron laser'20179,715,183'Device, lithographic apparatus, method for guiding radiation and device manufacturing method'20179,696,636'Lithographic apparatus, device manufacturing method and computer program'20179,696,630'Lithographic apparatus and device manufacturing method'20179,623,436'Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets'20179,606,458'Method for calibration of an encoder scale and a lithographic apparatus'20179,606,448'Lithographic apparatus and device manufacturing method'20179,594,306'Lithographic apparatus, spectral purity filter and device manufacturing method'20179,588,442'Lithographic apparatus and device manufacturing method'20179,581,914'Lithographic apparatus and device manufacturing method'20179,575,416'Lithographic apparatus, device manufacturing method and displacement measurement system'20179,541,843'Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid'20179,529,269'Lithographic apparatus and device manufacturing method'20169,523,921'EUV radiation system and lithographic apparatus'20169,516,732'Radiation source'20169,482,960'Pellicle for reticle and multilayer mirror'20169,482,966'Lithographic apparatus and device manufacturing method'20169,482,962'Lithographic apparatus and device manufacturing method'20169,477,160'Lithographic apparatus and device manufacturing method'20169,442,388'Lithographic apparatus and device manufacturing method'20169,411,250'Radiation system and lithographic apparatus'20169,414,477'Radiation source, lithographic apparatus and device manufacturing method'20169,395,630'Lithographic apparatus and method'20169,366,972'Lithographic apparatus and device manufacturing method'20169,360,765'Lithographic apparatus and device manufacturing method'20169,363,879'Module and method for producing extreme ultraviolet radiation'20169,354,529'Arrangement for use in a projection exposure tool for microlithography having a reflective optical element'20169,354,502'Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program'20169,329,500'Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensor'20169,298,110'Radiation source apparatus, lithographic apparatus, method of generating and delivering radiation and method for manufacturing a device'20169,268,236'Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder'20169,268,242'Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor'20169,207,548'Radiation source with a debris mitigation system, lithographic apparatus with a debris mitigation system, method for preventing debris from depositing on collector mirror, and device manufacturing method'20159,195,153'Lithographic apparatus and device manufacturing method'20159,192,039'Radiation source'20159,188,880'Lithographic apparatus and device manufacturing method involving a heater'20159,182,679'Lithographic apparatus and device manufacturing method'20159,164,401'Projection system and lithographic apparatus'20159,164,403'Radiation source, lithographic apparatus and device manufacturing method'20159,152,058'Lithographic apparatus and device manufacturing method involving a member and a fluid opening'20159,134,629'Illumination system, lithographic apparatus and method of forming an illumination mode'20159,134,623'Lithographic apparatus and device manufacturing method'20159,134,622'Lithographic apparatus and device manufacturing method'20159,134,632'Lithographic apparatus and device manufacturing method'20159,119,280'Radiation source'20159,110,377'Lithographic apparatus, EUV radiation generation apparatus and device manufacturing method'20159,097,982'Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filter'20159,097,987'Lithographic apparatus and device manufacturing method'20159,091,944'Source collector, lithographic apparatus and device manufacturing method'20159,091,940'Lithographic apparatus and method involving a fluid inlet and a fluid outlet'20159,081,299'Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap'2015RE045576'Dual stage lithographic apparatus and device manufacturing method'20159,057,967'Lithographic apparatus and device manufacturing method'20159,025,127'Lithographic apparatus and device manufacturing method'20159,013,679'Collector mirror assembly and method for producing extreme ultraviolet radiation'20158,982,359'System for detecting motion, lithographic apparatus and device manufacturing method'20158,975,599'Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus'20158,964,164'Lithographic apparatus and device manufacturing method'20158,953,144'Lithographic apparatus and device manufacturing method'20158,946,661'Radiation source, lithographic apparatus and device manufacturing method'20158,947,641'Lithographic apparatus and method'20158,922,749'Lithographic apparatus and patterning device'20148,917,380'Lithographic apparatus and method'20148,913,225'Lithographic apparatus and device manufacturing method'20148,901,521'Module and method for producing extreme ultraviolet radiation'20148,896,809'Lithographic apparatus and device manufacturing method'20148,866,111'Radiation source and method for lithographic apparatus and device manufacturing method'20148,860,922'Lithographic apparatus and device manufacturing method'20148,860,923'Lithographic apparatus and device manufacturing method'20148,836,913'Lithographic apparatus having an encoder type position sensor system'20148,817,229'Method of cooling an optical element, lithographic apparatus and method for manufacturing a device'20148,810,771'Lithographic apparatus and device manufacturing method'20148,804,097'Lithographic apparatus and device manufacturing method'20148,797,503'Lithographic apparatus and device manufacturing method with a liquid inlet above an aperture of a liquid confinement structure'20148,760,615'Lithographic apparatus having encoder type position sensor system'20148,755,032'Radiation source and lithographic apparatus'20148,730,485'Lithographic apparatus and device manufacturing method'20148,724,083'Lithographic apparatus and device manufacturing method'20148,724,084'Lithographic apparatus and device manufacturing method'20148,687,166'Lithographic apparatus having an encoder position sensor system'20148,685,632'Radiation source, lithographic apparatus and device manufacturing method'20148,675,172'Lithographic apparatus and method of removing liquid'20148,638,418'Lithographic apparatus'20148,638,415'Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets'20148,634,056'Lithographic apparatus and device manufacturing method'20148,629,970'Immersion lithographic apparatus with immersion fluid re-circulating system'20148,629,971'Lithographic apparatus and device manufacturing method'20148,598,551'EUV radiation source comprising a droplet accelerator and lithographic apparatus'20138,570,486'Lithographic apparatus and device manufacturing method'20138,558,989'Lithographic apparatus and device manufacturing method'20138,547,519'Lithographic apparatus and device manufacturing method'20138,547,525'EUV radiation generation apparatus'20138,542,344'Lithographic apparatus and device manufacturing method'20138,542,343'Lithographic apparatus'20138,537,330'Lithographic apparatus, device manufacturing method and computer readable medium'2013RE044446'Dual stage lithographic apparatus and device manufacturing method'20138,507,882'Radiation source and lithographic apparatus'20138,482,845'Lithographic apparatus and device manufacturing method'20138,477,287'Device manufacturing method, lithographic apparatus and a computer program'20138,472,002'Lithographic apparatus and device manufacturing method'20138,472,006'Lithographic apparatus and device manufacturing method'20138,462,826'Laser device'20138,446,568'Lithographic apparatus and device manufacturing method'20138,446,570'System and method for using a two part cover and a box for protecting a reticle'20138,431,916'Radiation source and lithographic apparatus'20138,427,629'Lithographic apparatus and device manufacturing method'20138,405,055'Source module, radiation source and lithographic apparatus'20138,390,820'Displacement measurement system having a prism, for displacement measurement between two or more gratings'20138,373,846'Radiation source, lithographic apparatus and device manufacturing method'20138,368,902'Lithographic apparatus and method for calibrating the same'20138,368,032'Radiation source, lithographic apparatus, and device manufacturing method'20138,368,040'Radiation system and lithographic apparatus'20138,344,341'Lithographic apparatus and device manufacturing method'20138,319,200'Radiation source, lithographic apparatus and device manufacturing method'20128,300,208'Lithographic apparatus and a method to compensate for the effect of disturbances on the projection system of a lithographic apparatus'20128,289,498'Lithographic apparatus and device manufacturing method'20128,278,636'Radiation sources and methods of generating radiation'20128,274,641'Substrate table, lithographic apparatus and device manufacturing method'20128,269,949'Lithographic apparatus and device manufacturing method'20128,264,670'Lithographic apparatus and device manufacturing method for clamping a patterning device'2012RE043576'Dual stage lithographic apparatus and device manufacturing method'20128,242,471'Radiation source and lithographic apparatus including a contamination trap'20128,232,537'Radiation source, lithographic apparatus and device manufacturing method'20128,208,120'Lithographic apparatus and device manufacturing method'20128,208,123'Lithographic apparatus and device manufacturing method'20128,208,124'Lithographic apparatus and device manufacturing method'20128,203,693'Liquid immersion lithography system comprising a tilted showerhead relative to a substrate'20128,203,694'Lithographic apparatus, projection assembly and active damping'20128,174,674'Lithographic apparatus and device manufacturing method'20128,174,671'Lithographic projection apparatus and method for controlling a support structure'20128,164,737'Lithographic apparatus having an active damping subassembly'20128,154,708'Lithographic apparatus and device manufacturing method'20128,102,502'Lithographic apparatus and device manufacturing method'20128,094,287'Lithographic appararus and method'20128,072,700'Optical apparatus for use in photolithography'20118,013,978'Lithographic apparatus and device manufacturing method'20117,999,912'Lithographic apparatus and sensor calibration method'20117,999,914'Lithographic apparatus and device manufacturing method'20117,982,850'Immersion lithographic apparatus and device manufacturing method with gas supply'20117,961,291'Lithographic apparatus and device manufacturing method'20117,956,982'Apparatus for cooling'20117,936,444'Lithographic apparatus and device manufacturing method'20117,932,999'Lithographic apparatus and device manufacturing method'20117,924,406'Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels'20117,906,059'Imprint lithography'20117,903,234'Lithographic apparatus, device manufacturing method and computer program product'20117,880,901'Lithographic apparatus and method for calibrating the same'20117,868,998'Lithographic apparatus'20117,859,686'Lithographic apparatus and method for calibrating the same'20107,830,497'System and method for using a two part cover and a box for protecting a reticle'20107,808,614'Lithographic apparatus and device manufacturing method'20107,804,579'Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product'20107,804,575'Lithographic apparatus and device manufacturing method having liquid evaporation control'20107,795,603'Lithographic apparatus and device manufacturing method'20107,751,027'Lithographic apparatus and device manufacturing method'20107,746,447'Lithographic apparatus, device manufacturing method and method of calibrating a lithographic apparatus'20107,733,459'Lithographic apparatus and device manufacturing method'20107,724,351'Lithographic apparatus, device manufacturing method and exchangeable optical element'20107,715,107'Optical element for correction of aberration, and a lithographic apparatus comprising same'20107,714,981'Lithographic apparatus and method'20107,710,540'Lithographic apparatus and device manufacturing method'20107,696,652'Electromagnetic actuator, method of manufacturing a part of an electromagnetic actuator, and lithographic apparatus comprising and electromagnetic actuator'20107,692,765'Lithographic apparatus and method of removing liquid'20107,671,968'Lithographic apparatus having masking parts and device manufacturing method'20107,671,970'Stage apparatus with two patterning devices, lithographic apparatus and device manufacturing method skipping an exposure field pitch'20107,667,822'Lithographic apparatus and stage apparatus'20107,656,502'Lithographic apparatus and device manufacturing method'20107,636,165'Displacement measurement systems lithographic apparatus and device manufacturing method'20097,633,599'Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the light'20097,619,207'Lithographic apparatus and device manufacturing method'20097,616,383'Lithographic apparatus and device manufacturing method'20097,612,867'Lithographic apparatus'20097,593,096'Lithographic apparatus and device manufacturing method'20097,593,092'Lithographic apparatus and device manufacturing method'20097,593,093'Lithographic apparatus and device manufacturing method'20097,589,818'Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus'20097,576,831'Method and apparatus for maintaining a machine part'20097,561,250'Lithographic apparatus having parts with a coated film adhered thereto'20097,554,105'Lithographic apparatus and device manufacturing method'20097,545,481'Lithographic apparatus and device manufacturing method'20097,542,127'Lithographic apparatus and method for manufacturing a device'20097,532,304'Lithographic apparatus and device manufacturing method'20097,528,965'Lithographic apparatus and method for calibrating the same'20097,528,929'Lithographic apparatus and device manufacturing method'20097,528,395'Radiation source, lithographic apparatus and device manufacturing method'20097,523,701'Imprint lithography method and apparatus'20097,525,640'Lithographic apparatus and device manufacturing method'20097,522,261'Lithographic apparatus and device manufacturing method'20097,515,281'Lithographic apparatus and device manufacturing method'20097,492,443'Device manufacturing method, device manufactured thereby and a mask for use in the method'20097,482,611'Lithographic apparatus and device manufacturing method'20097,483,120'Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method'20097,459,690'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20087,459,808'Lithographic apparatus and motor'20087,446,849'Lithographic apparatus and device manufacturing method'20087,436,484'Lithographic apparatus and device manufacturing method'20087,433,015'Lithographic apparatus and device manufacturing method'20087,423,733'Lithographic apparatus, device manufacturing method, and device manufactured thereby with docking system for positioning a patterning device'20087,423,722'Lithographic apparatus and device manufacturing method'20087,423,730'Lithographic apparatus'20087,418,902'Imprint lithography including alignment'20087,417,715'Stage apparatus, lithographic apparatus and device manufacturing method using two patterning devices'20087,411,653'Lithographic apparatus'20087,408,655'Lithographic apparatus and method for calibrating the same'20087,405,805'Lithographic apparatus and device manufacturing method'20087,388,648'Lithographic projection apparatus'20087,377,764'Imprint lithography'20087,372,541'Lithographic apparatus and device manufacturing method'20087,362,413'Uniformity correction for lithographic apparatus'20087,362,446'Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit'20087,359,029'Lithographic apparatus and method of reducing thermal distortion'20087,352,433'Lithographic apparatus and device manufacturing method'20087,352,434'Lithographic apparatus and device manufacturing method'2008RE040043'Positioning device having two object holders'20087,310,132'Lithographic apparatus and device manufacturing method'20077,292,312'Lithographic apparatus and method for calibrating the same'20077,256,871'Lithographic apparatus and method for calibrating the same'20077,256,864'Liquid immersion lithography system having a tilted showerhead relative to a substrate'20077,253,880'Lithographic apparatus and device manufacturing method'20077,248,339'Lithographic apparatus and device manufacturing method'20077,230,675'Lithographic apparatus, device manufacturing method and device manufactured therewith'20077,230,676'Lithographic apparatus and device manufacturing method'20077,224,436'Lithographic apparatus and device manufacturing method'20077,213,963'Lithographic apparatus and device manufacturing method'20077,209,220'System for using a two part cover for and a box for protecting a reticle'20077,202,934'Lithographic apparatus and device manufacturing method'20077,199,858'Lithographic apparatus and device manufacturing method'20077,193,232'Lithographic apparatus and device manufacturing method with substrate measurement not through liquid'20077,193,681'Lithographic apparatus and device manufacturing method'20077,170,586'Lithographic apparatus and device manufacturing method'20077,161,659'Dual stage lithographic apparatus and device manufacturing method'20077,161,267'Displacement apparatus, litographic apparatus, device manufacturing method, and device manufactured thereby'20077,136,214'Active faceted mirror system for lithography'20067,119,874'Lithographic apparatus and device manufacturing method'20067,119,883'Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light'20067,116,399'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20067,110,081'Lithographic apparatus and device manufacturing method'20067,110,086'Movable stage system, lithographic apparatus, and device manufacturing method'20067,110,083'Lithographic apparatus and device manufacturing method'20067,105,955'Lithographic apparatus, coil assembly, positioning device including a coil assembly, and device manufacturing method'20067,095,485'Lithographic linear motor, lithographic apparatus, and device manufacturing method'20067,075,616'Lithographic apparatus and device manufacturing method'20067,075,620'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20067,049,592'Lithographic apparatus and device manufacturing method'20067,030,963'Lithographic apparatus and device manufacturing method'20067,019,815'Off-axis leveling in lithographic projection apparatus'20066,987,278'Gas flushing system with recovery system for use in lithographic apparatus'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2021Based in Heeze, NL· patent location history
2003–2021Patents assigned to ASML NETHERLANDS BV (308)· patent assignee history
2005–2021Based in Eindhoven, NL· patent location history
2011Based in Fleeze, NL· patent location history
2012–2017Patents assigned to LOOPSTRA ERIK ROELOF (107)· patent assignee history
2012–2017Patents assigned to STREEFKERK BOB (31)· patent assignee history
2012–2017Patents assigned to MULKENS JOHANNES CATHARINUS HUBERTUS (30)· patent assignee history
2012–2017Patents assigned to HOOGENDAM CHRISTIAAN ALEXANDER (24)· patent assignee history
2017–2020Based in Veldhoven, NL· patent location history
2020–2021Based in Huernheim, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 308 | 2003–2021 |
| LOOPSTRA ERIK ROELOFself | 107 | 2012–2017 |
| STREEFKERK BOB | 31 | 2012–2017 |
| MULKENS JOHANNES CATHARINUS HUBERTUS | 30 | 2012–2017 |
| HOOGENDAM CHRISTIAAN ALEXANDER | 24 | 2012–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Heeze, NL | 199 | 1998–2021 |
| Eindhoven, NL | 124 | 2005–2021 |
| Veldhoven, NL | 4 | 2017–2020 |
| Huernheim, DE | 2 | 2020–2021 |
| Fleeze, NL | 1 | 2011 |