Inventor

Seiji Nakagawa

Inventor

Ryugasaki, JP

Overview

1998–2019

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%

G11BInformation storage based on relative movement between record carrier and transducer10%

G01NInvestigating or analysing materials by determining their chemical or physical properties7%

G05BControl or regulating systems in general7%

G06TImage data processing or generation, in general7%

A24BManufacture or preparation of tobacco for smoking or chewing3%

B05DProcesses for applying fluent materials to surfaces, in general3%

B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors3%

D21GCalenders3%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1998–2003Patents assigned to IBM (2)· patent assignee history

1999–2011Patents assigned to TOSHIBA KK (6)· patent assignee history

1999Patents assigned to D S TECHNICAL RESEARCH CO LTD (1)· patent assignee history

1999–2004Based in Yokohama, JP· patent location history

2003–2012Based in Kanagawa, JP· patent location history

2008Patents assigned to AIST (1)· patent assignee history

2010–2011Based in Oita, JP· patent location history

2011–2012Patents assigned to NAKAGAWA SEIJI (2)· patent assignee history

2013–2019Based in Ryugasaki, JP· patent location history

2018Based in Tokyo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations