Inventor
Kenneth Christopher Racette
Inventor
Fairfax, VT, US
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
C23CCoating metallic material28%
Y10TTechnical subjects covered by former us classification11%
G21KHandling of particles or ionising radiation not otherwise provided for6%
H01JElectric discharge tubes or discharge lamps6%
PatentTitleYear
7,473,501'Method for reducing photo-mask distortion'20097,239,376'Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices'20077,110,195'Monolithic hard pellicle'20066,979,518'Attenuated embedded phase shift photomask blanks'20056,858,357'Attenuated embedded phase shift photomask blanks'20056,730,445'Attenuated embedded phase shift photomask blanks'20046,696,205'Thin tantalum silicon composite film formation and annealing for use as electron projection scatterer'20046,682,860'Attenuated embedded phase shift photomask blanks'20046,653,027'Attenuated embedded phase shift photomask blanks'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2009Patents assigned to IBM (9)· patent assignee history
2003–2009Based in Fairfax, VT, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 9 | 2003–2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fairfax, VT, US | 9 | 2003–2009 |