Inventor
Shuichi Nishikido
Inventor
Koshi, JP
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B05Dprimary
B05DProcesses for applying fluent materials to surfaces, in general25%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
9,120,120'Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium'20158,851,092'Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2015Patents assigned to TOKYO ELECTRON LTD (2)· patent assignee history
2014Patents assigned to NISHIKIDO SHUICHI (1)· patent assignee history
2014Patents assigned to TOKUNAGA YOICHI (1)· patent assignee history
2014Patents assigned to YAMAMOTO TARO (1)· patent assignee history
2014Patents assigned to YOSHITAKA NAOTO (1)· patent assignee history
2014–2015Based in Koshi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 2 | 2014–2015 |
| NISHIKIDO SHUICHIself | 1 | 2014 |
| TOKUNAGA YOICHI | 1 | 2014 |
| YAMAMOTO TARO | 1 | 2014 |
| YOSHITAKA NAOTO | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Koshi, JP | 2 | 2014–2015 |