Inventor
Michael Patra
Inventor
Oberkochen, DE
Overview
Patents· 65 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
G02BOptical elements, systems or apparatus23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
G01BMeasuring length, thickness or similar linear dimensions4%
G01MTesting static or dynamic balance of machines or structures4%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
G05BControl or regulating systems in general4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light3%
G21KHandling of particles or ionising radiation not otherwise provided for2%
PatentTitleYear
10,928,733Illumination optic for projection lithography202110,928,734Optical assembly for guiding an output beam of a free electron laser202110,871,717Optical system for a projection exposure apparatus202010,802,403Method for the microlithographic production of microstructured components202010,678,144Projection exposure method and projection exposure apparatus for microlithography202010,514,611Projection exposure method and projection exposure apparatus for microlithography201910,310,381Illumination system for EUV projection lithography201910,288,894Optical component for use in a radiation source module of a projection exposure system201910,216,091Facet mirror for an illumination optical unit for projection lithography201910,191,382Illumination system for illuminating a mask in a microlithographic exposure apparatus201910,146,135Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation201810,133,183Optical component201810,126,658Illumination optical unit for EUV projection lithography201810,061,203Beam distributing optical device and associated unit, system and apparatus201810,018,917Illumination optical unit for EUV projection lithography201810,007,193Projection exposure apparatus and method for controlling a projection exposure apparatus20189,989,766Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens20189,989,767Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens20189,983,483Illumination system of a microlithographic projection exposure apparatus20189,977,333Illumination system for illuminating a mask in a microlithographic exposure apparatus20189,958,783Illumination system for EUV projection lithography20189,933,704Microlithography illumination optical system and microlithography projection exposure apparatus including same20189,915,874'Illumination optical unit and illumination system for EUV projection lithography'20189,897,925'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20189,891,530'Illumination optical unit'20189,880,474'System for producing structures in a substrate'20189,851,641Illumination system for an EUV projection lithographic projection exposure apparatus20179,841,683'Illumination optical unit for EUV projection lithography'20179,823,571'EUV light source for a lighting device of a microlithographic projection exposure apparatus'20179,823,577'Facet mirror for a projection exposure apparatus'20179,791,784'Assembly for a projection exposure apparatus for EUV projection lithography'20179,791,785'Method for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical unit'20179,753,375'Illumination optical unit for projection lithography'20179,678,438'Illumination system of a microlithographic projection exposure apparatus'20179,671,699'Illumination system of a microlithographic projection exposure apparatus'20179,645,501'Illumination optical unit for EUV projection lithography, and optical system comprising such an illumination optical unit'20179,612,537'Illumination optical unit for EUV projection lithography'20179,612,540'Method of operating a microlithographic apparatus'20179,599,904'Illumination system for illuminating a mask in a microlithographic exposure apparatus'20179,581,910'Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus'20179,563,129'Monitor system for determining orientations of mirror elements and EUV lithography system'20179,535,331'Optical system for a microlithographic projection exposure apparatus'20179,477,157'Illumination system of a microlithographic projection exposure apparatus'20169,423,686'Mask for microlithography and scanning projection exposure method utilizing the mask'20169,310,694'Illumination system for illuminating a mask in a microlithographic exposure apparatus'20169,280,061'Illumination optical unit for EUV projection lithography'20169,280,055'Illumination system of a microlithographic projection exposure apparatus'20169,261,695'Illumination system of a microlithographic projection exposure apparatus'20169,239,229'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20169,213,244'Illumination system of a microlithographic projection exposure apparatus'20159,161,426'EUV light source'20159,046,786'Illumination system of a microlithographic projection exposure apparatus'20159,019,475'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20159,013,684'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20159,001,309'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'20158,896,816'Projection exposure method, projection exposure apparatus, laser radiation source and bandwidth narrowing module for a laser radiation source'20148,891,057'Microlithographic projection exposure apparatus'20148,854,604'Microlithographic projection exposure apparatus'20148,724,086'Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation'20148,724,080'Optical raster element, optical integrator and illumination system of a microlithographic projection exposure apparatus'20148,593,645'Microlithographic projection exposure apparatus and related method'20138,514,372'Method for setting an illumination geometry for an illumination optical unit for EUV projection lithography'20138,467,031'Illumination system for illuminating a mask in a microlithographic exposure apparatus'20138,373,847'Polarization actuator'20138,339,577'Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2021Patents assigned to ZEISS CARL SMT GMBH (63)· patent assignee history
2012–2015Patents assigned to PATRA MICHAEL (11)· patent assignee history
2012–2015Patents assigned to DEGUENTHER MARKUS (7)· patent assignee history
2012–2015Patents assigned to LAYH MICHAEL (5)· patent assignee history
2012–2015Patents assigned to FIOLKA DAMIAN (4)· patent assignee history
2012–2021Based in Oberkochen, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 63 | 2012–2021 |
| PATRA MICHAELself | 11 | 2012–2015 |
| DEGUENTHER MARKUS | 7 | 2012–2015 |
| LAYH MICHAEL | 5 | 2012–2015 |
| FIOLKA DAMIAN | 4 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Oberkochen, DE | 65 | 2012–2021 |