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Inventor

Hiroshi Takagaki

Inventor
Higashiosaka, JP

Overview

7→
Patents
1993–2000
Patent span
Physics
Primary field (CPC G)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices47%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests40%
C07CAcyclic or carbocyclic compounds7%
C07DHeterocyclic compounds7%
PatentTitleYear
6,040,112'Photoresist composition'20005,916,728'Positive resist composition'19995,891,601'Positive resist composition'19995,368,987'Process for producing resist composition'19945,360,696'Resist composition'19945,283,324'Process for preparing radiation sensitive compound and positive resist composition'19945,198,323'Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2000Patents assigned to SUMITOMO CHEMICAL CO (7)· patent assignee history
1993–2000Based in Higashiosaka, JP· patent location history
1999Based in Osaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SUMITOMO CHEMICAL CO71993–2000
Locations
LocationPatentsSpan
Higashiosaka, JP51993–2000
Osaka, JP21999