Inventor

Rene Monshouwer

Inventor
Leiden, NL

Overview

10→
Patents
2004–2012
Patent span
Physics
Primary field (CPC G)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices77%
F16KValves8%
G01BMeasuring length, thickness or similar linear dimensions8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2012Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
2004–2012Based in Leiden, NL· patent location history
2005–2008Based in Eindhoven, NL· patent location history
2008Patents assigned to KONINKL PHILIPS ELECTRONICS NV (1)· patent assignee history
2012Patents assigned to BURGHOORN JACOBUS (1)· patent assignee history
2012Patents assigned to MONSHOUWER RENE (1)· patent assignee history
2012Patents assigned to MOS EVERHARDUS CORNELIS (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV102004–2012
BURGHOORN JACOBUS12012
KONINKL PHILIPS ELECTRONICS NV12008
MONSHOUWER RENEself12012
MOS EVERHARDUS CORNELIS12012
Locations
LocationPatentsSpan
Leiden, NL52004–2012
Eindhoven, NL52005–2008