LexDanaLexDanabeta
Inventor

Takafumi Taguchi

Inventor
Kobe, JP

Overview

21→
Patents
1986–2018
Patent span
Chemistry
Primary field (CPC C)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Kprimary
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients12%
B60CVehicle tyres10%
C08LCompositions of macromolecular compounds10%
Y10TTechnical subjects covered by former us classification9%
C08CTreatment or chemical modification of rubbers7%
C08JWorking-up6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
Y02TClimate change mitigation technologies related to transportation6%
H10BElectronic memory devices4%
H10DInorganic electric semiconductor devices4%
PatentTitleYear
9,917,049'Semiconductor device having contacts in drawing area and the contacts connected to word lines extending from element formation area'20189,315,647'Rubber composition and pneumatic tire'20169,181,413'Rubber composition and pneumatic tire'20159,177,854'Method of manufacturing semiconductor device using sidewall films for pitch multiplication in forming interconnects'20159,012,560'Rubber composition and pneumatic tire'20158,997,812'Pneumatic tire with specified inner liner'20158,857,482'Rubber composition for tread, method for producing the same, and heavy-load tire'20148,617,999'Method of manufacturing semiconductor device and computer readable medium for storing pattern size setting program'20138,336,005'Pattern dimension calculation method and computer program product'20128,307,310'Pattern generating method, method of manufacturing semiconductor device, computer program product, and pattern-shape-determination-parameter generating method'20128,283,791'Semiconductor device and method for manufacturing same'20128,266,552'Pattern generating method, method of manufacturing semiconductor device, and recording medium'20128,196,071'Creating mask data of integrated circuit patterns using calculated etching conversion difference'20128,143,171'Method for manufacturing semiconductor device and computer readable medium for storing pattern size setting program'20128,058,339'Rubber composition for tire and pneumatic tire'20117,498,366'Rubber composition for sidewall and pneumatic tire having sidewall using same'20095,624,764'Composite material of metal and rubber for use in industrial rubber articles'19975,284,713'Composite material of metal and rubber'19945,200,273'Metal composite of rubber, benothiazole sulfenamide and copper alloy'19934,929,512'Metal and composite material made of the metal and rubber'19904,616,599'Cooling arrangement for water-cooled internal combustion engine'1986

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1990–2016Patents assigned to SUMITOMO RUBBER IND (11)· patent assignee history
1990Based in Nishinomiya, JP· patent location history
1993–1997Based in Hyogo, JP· patent location history
2009–2016Based in Kobe, JP· patent location history
2011–2016Patents assigned to TAGUCHI TAKAFUMI (13)· patent assignee history
2012–2015Patents assigned to TOSHIBA KK (8)· patent assignee history
2012–2013Patents assigned to MASHITA HIROMITSU (7)· patent assignee history
2012–2013Patents assigned to KOTANI TOSHIYA (6)· patent assignee history
2012–2013Based in Kanagawa, JP· patent location history
2015–2018Based in Yokohama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAGUCHI TAKAFUMIself132011–2016
SUMITOMO RUBBER IND111990–2016
TOSHIBA KK82012–2015
MASHITA HIROMITSU72012–2013
KOTANI TOSHIYA62012–2013
Locations
LocationPatentsSpan
Kobe, JP72009–2016
Kanagawa, JP72012–2013
Hyogo, JP31993–1997
Yokohama, JP22015–2018
Nishinomiya, JP11990