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Inventor

Masahisa Watanabe

Inventor
Yokohama, JP

Overview

34→
Patents
2007–2020
Patent span
Performing operations
Primary field (CPC B)

Patents· 34 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Jprimary
B41JTypewriters33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
Y10TTechnical subjects covered by former us classification14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
C23CCoating metallic material6%
B29CShaping or joining of plastics5%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form5%
H01LSemiconductor devices5%
H10DInorganic electric semiconductor devices3%
B29LIndexing scheme associated with subclass b29c, relating to particular articles2%
PatentTitleYear
10,625,506Method for manufacturing liquid discharge head202010,570,508Film forming apparatus, film forming method and heat insulating member202010,343,406Liquid ejection head manufacturing method201910,322,584Method for manufacturing liquid ejection head201910,286,668Liquid ejection head manufacturing method201910,201,974Process for producing liquid discharge head20199,994,018Liquid ejection head and method of producing the same20189,956,776Method for producing liquid-ejection head20189,919,526'Method for manufacturing liquid discharge head'20189,873,255Liquid ejection head and method of manufacturing the same20189,852,907Mask structure forming method and film forming apparatus20179,809,027'Method of manufacturing structure and method of manufacturing liquid ejection head'20179,789,690'Method for manufacturing liquid ejection head'20179,388,495'Method of forming mask structure'20169,152,431'Computer and computer control method'20159,139,003'Method for producing liquid-ejection head'20159,090,066'Process for producing ink jet recording head'20158,980,110'Method of manufacturing liquid ejection head and method of processing substrate'20158,975,097'Method of manufacturing liquid discharge head'20158,834,817'Method for removing metal impurity from quartz component part used in heat processing apparatus of batch type'20148,722,510'Trench-filling method and film-forming system'20148,685,832'Trench filling method and method of manufacturing semiconductor integrated circuit device'20148,455,369'Trench embedding method'20138,430,476'Method for manufacturing liquid discharge head'20138,286,350'Method of manufacturing a liquid discharge head'20128,241,540'Method of manufacturing liquid discharge head'20128,187,898'Method for manufacturing liquid discharge head'20128,128,204'Liquid ejection head and method for manufacturing liquid ejection head'20128,122,850'Method and apparatus for processing polysilazane film'20128,007,074'Liquid discharge recording head'20117,891,784'Liquid ejection head and method for manufacturing liquid ejection head'20117,879,397'Method for processing polysilazane film'20117,563,481'Method and apparatus for processing polysilazane film'20097,300,596'Method of manufacturing liquid discharge head'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2020Patents assigned to CANON KK (22)· patent assignee history
2007–2015Based in Kanagawa, JP· patent location history
2009–2020Patents assigned to TOKYO ELECTRON LTD (10)· patent assignee history
2009–2012Based in Tokyo, JP· patent location history
2011–2020Based in Yokohama, JP· patent location history
2011–2020Based in Nirasaki, JP· patent location history
2012–2015Patents assigned to WATANABE MASAHISA (12)· patent assignee history
2012–2013Patents assigned to OHSUMI MASAKI (4)· patent assignee history
2012Patents assigned to KOYAMA SHUJI (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK222007–2020
WATANABE MASAHISAself122012–2015
TOKYO ELECTRON LTD102009–2020
OHSUMI MASAKI42012–2013
KOYAMA SHUJI32012
Locations
LocationPatentsSpan
Yokohama, JP222011–2020
Nirasaki, JP82011–2020
Kanagawa, JP22007–2015
Tokyo, JP22009–2012