Inventor
MARCO KOERT STAVENGA
Inventor
NL
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices46%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
H01LSemiconductor devices15%
PatentTitleYear
12,197,140Substrate table, immersion lithographic apparatus and device manufacturing method202512,072,635Lithographic apparatus and a method of operating the apparatus202411,378,893Lithographic apparatus and device manufacturing method involving a heater202211,215,933Substrate table, immersion lithographic apparatus and device manufacturing method202211,204,558Particle suppression systems and methods202111,187,991Lithographic apparatus and a method of operating the apparatus2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2021Patents assigned to ASML HOLDING NV (1)· patent assignee history
2021–2025Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 6 | 2021–2025 |
| ASML HOLDING NV | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 6 | 2021–2025 |