Inventor

Tadanori Inoue

Inventor
Ibaragi, JP

Overview

8→
Patents
1978–2001
Patent span
Performing operations
Primary field (CPC B)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
B41CProcesses for the manufacture or reproduction of printing surfaces10%
D05BSewing10%
Y10TTechnical subjects covered by former us classification10%
B29CShaping or joining of plastics5%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts5%
B41NPrinting plates or foils5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–1981Patents assigned to SUMITOMO CHEMICAL CO (6)· patent assignee history
1978–1981Based in Ibaragi, JP· patent location history
1979–1981Based in Ibaraki, JP· patent location history
2001Patents assigned to YAMATO SEWING MACHINE MFG (1)· patent assignee history
2001Patents assigned to YAMATO SEWING MACHINE SEIZO CO (1)· patent assignee history
2001Based in Toyonaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SUMITOMO CHEMICAL CO61978–1981
YAMATO SEWING MACHINE MFG12001
YAMATO SEWING MACHINE SEIZO CO12001
Locations
LocationPatentsSpan
Ibaragi, JP41978–1981
Toyonaka, JP22001
Ibaraki, JP21979–1981