Inventor

Neil F. Haley

Inventor

Wellington, CO, US

Overview

22→

Patents

1979–2006

Patent span

Physics

Primary field (CPC G)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Sprimary

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests24%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%

B41CProcesses for the manufacture or reproduction of printing surfaces17%

B41MPrinting, duplicating, marking, or copying processes10%

G03GElectrography6%

C07DHeterocyclic compounds3%

C09KMaterials for miscellaneous applications, not provided for elsewhere3%

G03CPhotosensitive materials for photographic purposes3%

H01BCables3%

A61KPreparations for medical, dental or toiletry purposes2%

PatentTitleYear

7,056,639'Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid'2006 6,806,020'Negative working imageable composition containing sulfonic acid'2004 6,550,989'Apparatus and methods for development of resist patterns'2003 6,090,532'Positive-working infrared radiation sensitive composition and printing plate and imaging method'2000 6,083,662'Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate'2000 6,063,544'Positive-working printing plate and method of providing a positive image therefrom using laser imaging'2000 5,663,037'Radiation-sensitive composition containing a resole resin, a novolac resin an infrared absorber and a triazine and use thereof in lithographic printing plates'1997 5,491,046'Method of imaging a lithographic printing plate'1996 5,466,557'Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates'1995 5,403,686'Electrophotographic element and imaging method exhibiting reduced incidence of laser interference patterns'1995 5,372,915'Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer'1994 5,372,907'Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates'1994 5,340,699'Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates'1994 5,086,060'Compound and method for treating skin for acne or psoriasis'1992 4,783,393'Dye mixtures and optical recording elements containing same'1988 4,743,528'Enhanced imaging composition containing an azinium activator'1988 4,743,529'Negative working photoresists responsive to shorter visible wavelengths and novel coated articles'1988 4,743,531'Dye sensitized photographic imaging system'1988 4,743,530'Negative working photoresists responsive to longer wavelengths and novel coated articles'1988 4,478,922'Electrically conductive compositions'1984 4,439,505'Electrical conductive compositions'1984 4,175,956'Electrophotosensitive materials for migration imaging processes'1979

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1979–2006Patents assigned to EASTMAN KODAK CO (17)· patent assignee history

1979–1992Based in Fairport, NY, US· patent location history

1994–2006Based in Wellington, CO, US· patent location history

2000–2004Patents assigned to KODAK POLYCHROME GRAPHICS LLC (5)· patent assignee history

2000Based in Windsor, CO, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
EASTMAN KODAK CO	17	1979–2006
KODAK POLYCHROME GRAPHICS LLC	5	2000–2004

Locations

Location	Patents	Span
Wellington, CO, US	12	1994–2006
Fairport, New York, US	9	1979–1992
Windsor, CO, US	1	2000