LexDanaLexDanabeta
Inventor

Hiromi Kobayashi

Inventor
Ibaraki, JP

Overview

38→
Patents
1983–2018
Patent span
Mechanical engineering
Primary field (CPC F)

Patents· 38 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

F04Dprimary
F04DNon-positive-displacement pumps21%
F05DIndexing scheme for aspects relating to non-positive-displacement machines or engines, gas-turbines or jet-propulsion plants10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
G06FElectric digital data processing6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
C07CAcyclic or carbocyclic compounds5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
H01LSemiconductor devices4%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments3%
PatentTitleYear
9,963,605Coloring composition, ink jet recording ink, and ink jet recording method20189,835,945Positive resist composition and method of pattern formation with the same20179,798,235'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20179,701,839'Compound, coloring composition, ink jet recording ink, ink jet recording method, ink jet printer cartridge, ink jet recording material, color filter, color toner, and transfer ink'20179,703,196'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20179,690,875'Providing search results for mobile computing devices'20179,465,292'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20169,316,912'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20169,157,450'Impeller and turbomachinery including the impeller'20159,139,954'Aqueous coloring composition for textile printing, textile printing method, and fabric'20158,828,643'Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same'20148,616,843'Turbo machinery'20138,475,131'Centrifugal compressor'20138,426,766'Welding method and welding apparatus for an impeller'20138,408,873'Welding slot sealing structure and welding method'20138,313,290'Centrifugal compressor having vaneless diffuser and vaneless diffuser thereof'20128,308,420'Centrifugal compressor, impeller and operating method of the same'20128,287,236'Multistage centrifugal compressor'20128,267,644'Multistage centrifugal compressor'20128,112,404'Providing search results for mobile computing devices'20127,664,884'Media drive that creates a transfer unnecessary period, and power saving method thereof'20107,451,261'Data storage device and control method with buffer control thereof'20087,373,460'Media drive and command execution method thereof'20087,320,050'Data transmission control method and storage device'20086,989,226'Water-developable photosensitive resin for flexography'20066,692,224'Turbo compressor'20046,435,822'Labyrinth sealing device, and fluid machine providing the same'20026,302,645'Labyrinth sealing device, and fluid machine providing the same'20016,203,275'Centrifugal compressor and diffuser for centrifugal compressor'20016,039,535'Labyrinth sealing device, and fluid machine providing the same'20005,709,531'Centrifugal compressor and vaned diffuser'19985,516,263'Centrifugal compressor and vaned diffuser'19965,506,409'Radiation detecting device and the manufacture thereof'19965,228,832'Mixed flow compressor'19935,062,766'Turbo compressor'19914,938,661'Multistage centrifugal compressor'19904,719,348'Optical sensor having heating element to heat amorphous semiconductor film'19884,421,457'Diffuser of centrifugal fluid machine'1983

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1983–2015Patents assigned to HITACHI LTD (12)· patent assignee history
1983–2002Based in Ibaraki, JP· patent location history
2008–2018Based in Kanagawa, JP· patent location history
2012–2017Patents assigned to KOBAYASHI HIROMI (11)· patent assignee history
2012–2013Patents assigned to HITACHI PLANT TECHNOLOGIES LTD (8)· patent assignee history
2012–2013Patents assigned to KUWANO TETSUYA (7)· patent assignee history
2012–2015Based in Kasumigaura, JP· patent location history
2012–2017Based in Tokyo, JP· patent location history
2014–2018Patents assigned to FUJIFILM CORP (9)· patent assignee history
2014–2017Based in Shizuoka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD121983–2015
KOBAYASHI HIROMIself112012–2017
FUJIFILM CORP92014–2018
HITACHI PLANT TECHNOLOGIES LTD82012–2013
KUWANO TETSUYA72012–2013
Locations
LocationPatentsSpan
Ibaraki, JP91983–2002
Kanagawa, JP72008–2018
Kasumigaura, JP62012–2015
Shizuoka, JP52014–2017
Tokyo, JP52012–2017