Inventor
Shane Hsieh
Inventor
Bridgewater, NJ, US
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices79%
B41NPrinting plates or foils8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
B41MPrinting, duplicating, marking, or copying processes4%
PatentTitleYear
6,143,461'Process for obtaining a color image with improved resolution'20006,140,008'Infrared laser imageable, peel developable, single sheet color proofing system having a crosslinked thermal transfer layer'20005,738,970'Negative working, peel developable, single sheet color proofing system with polyvinyl acetal photoadhering layer'19985,436,112'Method for producing a negative image with color proofing element containing a urethane monomer'19955,436,106'Process for the production of a color test image using quinone diazide photosensitive recording material'19955,348,833'Colored positive-working quinone diazide photosensitive recording material for the production of a color test image utilizing adhesive layer containing alkali-insoluble organic polymer and alkali-soluble polyester'19945,084,372'Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound'19925,066,568'Method of developing negative working photographic elements'19915,008,175'Copying materials'19914,980,271'Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate'19904,912,021'Developer-finisher compositions for lithographic plates'19904,873,174'Method of using developer-finisher compositions for lithographic plates'19894,851,324'Phenoxy propanol containing developer compositions for lithographic plates having neutral pH'19894,786,580'Method of developing imaged diazo material with propanol containing developer composition'19884,783,395'Desensitizing solution for lithographic printing plates'19884,780,396'Organic solvent free developer compositions for lithographic plates having neutral pH comprising a lithium and potassium salt and an anionic surfactant'19884,728,597'Desensitizing solution for lithographic printing plates'19884,592,992'Developer compositions for lithographic plates'19864,374,920'Positive developer containing non-ionic surfactants'19834,366,224'Inorganic lithium developer composition'19824,189,320'Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures'1980Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1980–1986Patents assigned to HOECHST CO AMERICAN (4)· patent assignee history
1980Based in Somerville, NJ, US· patent location history
1982–2000Based in Bridgewater, NJ, US· patent location history
1988–1995Patents assigned to HOECHST CELANESE CORP (11)· patent assignee history
1994–1995Patents assigned to HOECHST AG (2)· patent assignee history
1998Patents assigned to BAYER AG (1)· patent assignee history
2000Patents assigned to AGFA CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HOECHST CELANESE CORP | 11 | 1988–1995 |
| HOECHST CO AMERICAN | 4 | 1980–1986 |
| AGFA CORP | 2 | 2000 |
| HOECHST AG | 2 | 1994–1995 |
| BAYER AG | 1 | 1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Bridgewater, New Jersey, US | 20 | 1982–2000 |
| Somerville, New Jersey, US | 1 | 1980 |