Inventor
Christoph Friedrich
Inventor
Mnchen, DE
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices63%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
B82YSpecific uses or applications of nanostructures13%
PatentTitleYear
6,686,098'Lithography method and lithography mask'20046,660,437'Alternating phase mask'20036,635,388'Contact hole fabrication with the aid of mutually crossing sudden phase shift edges of a single phase shift mask'20036,631,511'Generating mask layout data for simulation of lithographic processes'20036,466,373'Trimming mask with semitransparent phase-shifting regions'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002Patents assigned to SIEMENS AG (1)· patent assignee history
2002–2004Based in Mnchen, DE· patent location history
2003–2004Patents assigned to INFINEON TECHNOLOGIES AG (4)· patent assignee history
2003Based in Munich, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INFINEON TECHNOLOGIES AG | 4 | 2003–2004 |
| SIEMENS AG | 1 | 2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mnchen, DE | 4 | 2002–2004 |
| Munich, DE | 1 | 2003 |