Inventor

Satoshi Takechi

Inventor

Kawasaki, JP

Overview

1991–2012

Patent span

Physics

Primary field (CPC G)

Patents· 32 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices49%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests31%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients8%

C07CAcyclic or carbocyclic compounds2%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%

PatentTitleYear

8,257,909'Method of manufacturing semiconductor device, and method of forming resist pattern'2012 7,465,529'Radiation sensitive material and method for forming pattern'2008 7,179,580'Radiation sensitive material and method for forming pattern'2007 7,129,017'Chemically amplified resist composition and method for forming patterned film using same'2006 7,060,635'Method of manufacturing semiconductor device and method of forming pattern'2006 6,902,859'Chemically amplified resist composition and method for forming patterned film using same'2005 6,887,649'Multi-layered resist structure and manufacturing method of semiconductor device'2005 6,790,580'Resist material and method for forming a resist pattern with the resist material'2004 6,790,589'Radiation sensitive material and method for forming pattern'2004 6,699,645'Method for the formation of resist patterns'2004 6,344,304'Radiation sensitive material and method for forming pattern'2002 6,329,125'Chemically amplified resist compositions and process for the formation of resist patterns'2001 6,248,920'Preparation process for esters and resist materials'2001 6,207,342'Chemically amplified resist material and process for the formation of resist patterns'2001 6,200,725'Chemically amplified resist compositions and process for the formation of resist patterns'2001 6,120,977'Photoresist with bleaching effect'2000 6,013,416'Chemically amplified resist compositions and process for the formation of resist patterns'2000 6,004,720'Radiation sensitive material and method for forming pattern'1999 5,968,713'Chemically amplified resist compositions and process for the formation of resist patterns'1999 5,879,851'Method for forming resist patterns by using an ammonium or morpholine compound as a developer'1999 5,856,071'Resist material including si-containing resist having acid removable group combined with photo-acid generator'1999 5,506,088'Chemically amplified resist composition and process for forming resist pattern using same'1996 5,443,690'Pattern formation material and pattern formation method'1995 5,403,699'Process for formation of resist patterns'1995 5,326,670'Process for forming resist pattern'1994 5,192,643'Pattern-forming method and radiation resist for use when working this pattern-forming method'1993 5,153,103'Resist composition and pattern formation process'1992 5,104,479'Resist material for energy beam lithography and method of using the same'1992 5,087,551'Process for preparing of semiconductor device and pattern-forming coating solution used for this process'1992 5,068,169'Process for production of semiconductor device'1991 5,066,751'Resist material for energy beam lithography and method of using the same'1991 5,019,485'Process of using an electrically conductive layer-providing composition for formation of resist patterns'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2008Patents assigned to FUJITSU LTD (31)· patent assignee history

1991–1994Based in Machida, JP· patent location history

1995–2012Based in Kawasaki, JP· patent location history

1995Based in Tokyo, JP· patent location history

2004Based in Kanagawa, JP· patent location history

2012Patents assigned to FUJITSU SEMICONDUCTOR LTD (1)· patent assignee history

2012Patents assigned to TAKECHI SATOSHI (1)· patent assignee history

2012Patents assigned to YAMAMOTO HAJIME (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
FUJITSU LTD	31	1991–2008
FUJITSU SEMICONDUCTOR LTD	1	2012
TAKECHI SATOSHIself	1	2012
YAMAMOTO HAJIME	1	2012

Locations

Location	Patents	Span
Kawasaki, JP	22	1995–2012
Machida, JP	8	1991–1994
Kanagawa, JP	1	2004
Tokyo, JP	1	1995