Inventor

Isao Iida

Inventor
Tokyo, JP

Overview

6→
Patents
2000–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Kprimary
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients28%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds22%
C08LCompositions of macromolecular compounds22%
B05DProcesses for applying fluent materials to surfaces, in general6%
C08JWorking-up6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
C09JAdhesives6%
C09KMaterials for miscellaneous applications, not provided for elsewhere6%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000Patents assigned to TOSHIBA SILICONE (1)· patent assignee history
2000–2021Based in Tokyo, JP· patent location history
2013–2021Patents assigned to MOMENTIVE PERFORMANCE MAT JP (4)· patent assignee history
2013Patents assigned to IIDA ISAO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MOMENTIVE PERFORMANCE MAT JP42013–2021
IIDA ISAOself12013
TOSHIBA SILICONE12000
Locations
LocationPatentsSpan
Tokyo, JP62000–2021